Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.41 |
| ▸ | PKM | P14618 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | DPP4 | P27487 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | GRM2 | Q14416 | 2/20 | 0.33 |
| ▸ | GRM5 | P41594 | 1/20 | 0.33 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1732678 | 0.95 | HSD11B1 (0.41) | HSD11B1PKML3MBTL1DPP4ALDH1A1 | |
| SCHEMBL7733822 | 0.86 | ALDH1A1 (0.37) | HSD11B1PKML3MBTL1ALDH1A1MEN1 | |
| SCHEMBL963951 | 0.85 | HSD11B1 (0.35) | HSD11B1PKML3MBTL1ALDH1A1 | |
| SCHEMBL18315200 | 0.85 | THRB (0.40) | HSD11B1PKML3MBTL1ALDH1A1GAA | |
| SCHEMBL5608428 | 0.85 | MEN1 (0.46) | HSD11B1MEN1KMT2ALMNASMN1; SMN2 | |
| SCHEMBL6226952 | 0.85 | HSD11B1 (0.35) | HSD11B1PKML3MBTL1ALDH1A1 | |
| SCHEMBL29281855 | 0.83 | HSD11B1 (0.34) | HSD11B1PKML3MBTL1ALDH1A1 | |
| SCHEMBL282760 | 0.83 | PKM (0.42) | PKML3MBTL1ALDH1A1GRM2GRM5 | |
| SCHEMBL19149461 | 0.82 | DPP4 (0.38) | HSD11B1PKML3MBTL1DPP4ALDH1A1 | |
| SCHEMBL962559 | 0.80 | ALDH1A1 (0.43) | HSD11B1PKML3MBTL1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113444559-B | Battery foil rolling additive and preparation method and application thereof | 奎克化学（中国）有限公司 | 2023-03-21 | — | — | CN | claimed |
| CN-113444559-A | Battery foil rolling additive and preparation method and application thereof | 奎克化学（中国）有限公司 | 2021-09-28 | — | — | CN | claimed |
| CN-117946592-A | Low-dielectric-constant organic barrier layer photo-curing adhesive and use method and application thereof | 西安思摩威新材料有限公司 | 2024-04-30 | — | — | CN | disclosed |
| US-20230375928-A1 | Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-23 | — | — | US | disclosed |
| US-20230244142-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| CN-113444559-B | Battery foil rolling additive and preparation method and application thereof | 奎克化学（中国）有限公司 | 2023-03-21 | — | — | CN | disclosed |
| CN-113444559-A | Battery foil rolling additive and preparation method and application thereof | 奎克化学（中国）有限公司 | 2021-09-28 | — | — | CN | disclosed |
| EP-3106477-B1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-08-29 | — | — | EP | disclosed |
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-20020016516-A1 | Hydrocarbon bonded to a carbon atom which is bonded to a hydroxyl group, a methane group, and an adamantane ring; or its protected derivatives; alcohol intermediates for acrylic ester monomers for hydrophilic, adhesive photoresists | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-6344590-B1 | HYDROCARBON BONDED TO A CARBON ATOM WHICH IS BONDED TO A HYDROXYL GROUP, A METHANE GROUP, AND AN ADAMANTANE RING; OR ITS PROTECTED DERIVATIVES; ALCOHOL INTERMEDIATES FOR ACRYLIC ESTER MONOMERS FOR HYDROPHILIC, ADHESIVE PHOTORESISTS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-02-05 | — | — | US | disclosed |
| EP-1172694-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1172384-A1 | POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| US-6235851-B1 | ESTERIFICATION OR AMIDATION REACTION OF AN ADAMANTANE DERIVATIVE; GROUP 3A METAL CATALYST | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |
| EP-0990632-A1 | ADAMANTANEMETHANOL DERIVATIVES AND PROCESS FOR THE PREPARATION THEREOF | Daicel Chemical Industries, Ltd. (JP) | 2000-04-05 | — | — | EP | disclosed |
| EP-0927711-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM | Daicel Chemical Industries, Ltd. (JP) | 1999-07-07 | — | — | EP | disclosed |
| EP-0915077-A1 | POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 1999-05-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | AMD1, ALDH7A1, TMEM164 | HSD11B1 517/4885PKM 4304/4885L3MBTL1 3475/4885 |
| US-20020016516-A1 | Hydrocarbon bonded to a carbon atom which is bonded to a hydroxyl group, a methane group, and an adamantane ring; or its protected derivatives; alcohol intermediates for acrylic ester monomers for hydrophilic, adhesive photoresists | ADH1A, ADGRF1, ADGRE5 | HSD11B1 283/4885PKM 4544/4885L3MBTL1 1820/4885 |
| US-20230375928-A1 | Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process | NAF1, RALA, RSU1 | HSD11B1 2207/4885PKM 3914/4885L3MBTL1 2407/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.