SCHEMBL410299

SCHEMBL410299

C=Cc1ccc(OC(=O)OC)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.44
MEN1 O00255 2/20 0.44
TAS1R3 Q7RTX0 2/20 0.43
TAS1R1 Q7RTX1 2/20 0.43
ALDH1A1 P00352 3/20 0.42
MAPT P10636 4/20 0.41
HTT P42858 2/20 0.41
KDM4E B2RXH2 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
JAK2 O60674 1/20 0.41
GAA P10253 1/20 0.41
LMNA P02545 2/20 0.41
HSD17B10 Q99714 1/20 0.41
GSK3B P49841 1/20 0.41
TGM2 P21980 1/20 0.40
HDAC3 O15379 1/20 0.40
HDAC1 Q13547 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2791741 0.88 ALDH1A1 (0.50) KMT2AMEN1ALDH1A1MAPTKDM4E
SCHEMBL6550801 0.84 MMP2 (0.43) KMT2AMEN1TAS1R3TAS1R1ALDH1A1
SCHEMBL676909 0.83 KMT2A (0.58) KMT2AMEN1ALDH1A1MAPTHTT
SCHEMBL1667621 0.82 ALDH1A1 (0.57) KMT2AMEN1ALDH1A1MAPTHTT
SCHEMBL20364760 0.82 THRB (0.56) KMT2AMEN1ALDH1A1MAPTHTT
SCHEMBL29331003 0.81 MAPT (0.49) KMT2AMEN1ALDH1A1MAPTHTT
SCHEMBL14493191 0.81 ALDH1A1 (0.48) KMT2AMEN1ALDH1A1MAPTLMNA
SCHEMBL1888207 0.81 ALDH1A1 (0.42) KMT2AMEN1ALDH1A1MAPTKDM4E
SCHEMBL6272758 0.80 KMT2A (0.53) KMT2AMEN1TAS1R3TAS1R1ALDH1A1
SCHEMBL220773 0.80 ELANE (0.62) KMT2AMEN1ALDH1A1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025048577-A1 METHOD FOR MANUFACTURING FUNCTIONAL POLYMERS BY ANIONIC POLYMERIZATION 주식회사 이엔에프테크놀로지 2025-03-06 WO disclosed
US-20230348351-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-02 US disclosed
US-20230348351-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-02 US disclosed
CN-107849167-B Method for producing polymer for electronic material and polymer for electronic material obtained by the production method 丸善石油化学株式会社 2021-02-23 CN disclosed
US-9598553-B2 Metal nanoparticle composite and method for producing the same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2017-03-21 US disclosed
US-20140058028-A1 METAL NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2014-02-27 US disclosed
EP-2669029-A1 METALLIC NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME Maruzen Petrochemical Co., Ltd. (JP) 2013-12-04 EP disclosed
US-8492483-B2 ABA triblock copolymer and process for producing the same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-07-23 US disclosed
US-20120172535-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2012-07-05 US disclosed
EP-2465885-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF Maruzen Petrochemical Co., Ltd. (JP) 2012-06-20 EP disclosed
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US disclosed
EP-0780732-B1 Polymer composition and resist material WAKO PURE CHEM IND LTD (JP) 2003-07-09 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
US-6303264-B1 PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2001-10-16 US disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
US-5976759-A ALKALI SOLUBLE BY HEATING WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1999-11-02 US disclosed
EP-0875787-A1 Method for reducing the substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 1998-11-04 EP disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed
EP-0780732-A2 Polymer composition and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-06-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230348351-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND PHOSPHO1, RER1, RIF1 KMT2A 1210/4885MEN1 2581/4885TAS1R3 1766/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.