Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 1/20 | 0.43 |
| ▸ | MMP9 | P14780 | 1/20 | 0.43 |
| ▸ | MMP14 | P50281 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.38 |
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4150615 | 0.89 | TAS1R3 (0.36) | MMP2MMP9MMP14CA12AKR1B10 | |
| SCHEMBL1665621 | 0.84 | ALDH1A3 (0.56) | MMP2MMP9MMP14CA12AKR1B10 | |
| SCHEMBL6780646 | 0.84 | MAPT (0.40) | MMP2MMP9MMP14MAPTSMN1; SMN2 | |
| SCHEMBL410299 | 0.84 | KMT2A (0.44) | MMP2MMP9MMP14MAPTSMN1; SMN2 | |
| SCHEMBL2791741 | 0.83 | ALDH1A1 (0.50) | MAPTSMN1; SMN2KDM4EALDH1A1MEN1 | |
| SCHEMBL5942242 | 0.81 | PTGS2 (0.43) | CA12CA1CA2CA7CA9 | |
| SCHEMBL9338606 | 0.79 | MAPT (0.52) | MMP2MMP9MMP14CA12AKR1B10 | |
| SCHEMBL6272847 | 0.79 | CA2 (0.44) | CA2KDM4EGLAALDH1A1TAS1R3 | |
| SCHEMBL7079093 | 0.79 | ELANE (0.59) | CA2MAPTSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL10204666 | 0.79 | ELANE (0.46) | MAPTSMN1; SMN2KDM4EALDH1A1ALDH1A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0789279-B2 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2004-12-08 | — | — | EP | disclosed |
| US-6770780-B1 | QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS | JSR CORPORATION (JP) | 2004-08-03 | — | — | US | disclosed |
| EP-0780732-B1 | Polymer composition and resist material | WAKO PURE CHEM IND LTD (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-0789279-B1 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| US-5976759-A | ALKALI SOLUBLE BY HEATING | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| EP-0264908-B1 | High sensitivity resists having autodecomposition temperatures greater than about 160 C | IBM (US) | 1996-03-20 | — | — | EP | disclosed |
| US-5204216-A | RADIATION-SENSITIVE MIXTURE | BASF AKTIENGESELLSCHAFT (DE) | 1993-04-20 | — | — | US | disclosed |
| US-5035979-A | Radiation-sensitive mixture | BASF AKTIENGESELLSCHAFT (DE) | 1991-07-30 | — | — | US | disclosed |
| US-5034305-A | Mixtures for photoresists of water insolublr binders soluble in alkaline mixtures, compound forming a strong acid and solubility inhibitors | BASF AKTIENGESELLSCHAFT (DE) | 1991-07-23 | — | — | US | disclosed |
| US-4931379-A | ADDITION POLYMERS HAVING PENDANT ACID-LABILE GROUPS, E.G CARBONATES, AND SIDECHAINS FOR ADDED STABILITY; SEMICONDUCTORS; MICROLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1990-06-05 | — | — | US | disclosed |
| EP-0264908-A2 | High sensitivity resists having autodecomposition temperatures greater than about 160 C | International Business Machines Corporation (US) | 1988-04-27 | — | — | EP | disclosed |