SCHEMBL413017

SCHEMBL413017

C=CC(=O)Nc1ccccc1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 4/20 0.59
MMP2 P08253 4/20 0.59
MMP9 P14780 4/20 0.59
TGM2 P21980 2/20 0.57
NPC1 O15118 4/20 0.53
GAA P10253 3/20 0.53
TP53 P04637 2/20 0.53
LMNA P02545 1/20 0.53
HTT P42858 1/20 0.53
KMT2A Q03164 4/20 0.53
KDM4E B2RXH2 2/20 0.53
MAPT P10636 2/20 0.53
TDP1 Q9NUW8 1/20 0.53
PTPN1 P18031 1/20 0.50
PTPN11 Q06124 1/20 0.50
MEN1 O00255 3/20 0.49
GSTO1 P78417 1/20 0.48
RAB9A P51151 3/20 0.47
METAP2 P50579 1/20 0.46
PKM P14618 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29366956 1.00 MMP1 (0.59) MMP1MMP2MMP9TGM2NPC1
SCHEMBL31228347 0.87 TGM2 (0.65) TGM2LMNAKDM4EMAPTPTPN1
SCHEMBL613090 0.87 TGM2 (0.65) TGM2LMNAKDM4EMAPTPTPN1
SCHEMBL6663901 0.85 TGM2 (0.48) MMP1MMP2MMP9TGM2LMNA
SCHEMBL7771097 0.83 MMP1 (0.73) MMP1MMP2MMP9NPC1GAA
SCHEMBL7771073 0.83 MMP1 (0.73) MMP1MMP2MMP9NPC1GAA
SCHEMBL7191119 0.82 BTK (0.49) MMP1MMP2MMP9TGM2NPC1
SCHEMBL14666462 0.82 PTPN1 (0.53) TGM2GAALMNAKMT2AKDM4E
SCHEMBL8641397 0.82 MMP1 (0.61) MMP1MMP2MMP9NPC1GAA
SCHEMBL17443378 0.80 TGM2 (0.57) TGM2LMNAKDM4EMAPTPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 972 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119049778-A Waterproof aluminum alloy cable and preparation method thereof 飞红线缆集团有限公司 2024-11-29 CN claimed
WO-2024024502-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2024-02-01 WO claimed
CN-116848466-A Positive photosensitive resin composition 日产化学株式会社 2023-10-03 CN claimed
WO-2022168732-A1 POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2022-08-11 WO claimed
CN-105652592-B Photosensitive composition of urethane-modified phenolic resin 乐凯华光印刷科技有限公司 2020-02-21 CN claimed
CN-110609444-A Positive thermosensitive CTP photosensitive emulsion and preparation method thereof 河北金锐美科技有限公司 2019-12-24 CN claimed
CN-103772713-B Graft modification polypropylene acid amides and preparation method thereof SINOPEC CORP. (CN) 2016-05-18 CN claimed
CN-103772713-A Graft-modified polyacrylamide and preparation method thereof CHINA PETROLEUM & CHEMICAL 2014-05-07 CN claimed
CN-101735338-B Method for preparing light sensitive type water soluble chitosan derivative UNIV BEIJING CHEMICAL 2011-08-31 CN claimed
CN-101735338-A Method for preparing light sensitive type water soluble chitosan derivative UNIV BEIJING CHEMICAL 2010-06-16 CN claimed
EP-0774692-A2 Radiation-sensitive recording material for the production of planographic printing plates HOECHST AKTIENGESELLSCHAFT (DE) 1997-05-21 EP claimed
US-5306774-A Protective coating EASTMAN KODAK COMPANY (US) 1994-04-26 US claimed
US-5250626-A Miscible blends of polyphosphazenes and acidic functional polymers EASTMAN KODAK COMPANY (US) 1993-10-05 US claimed
EP-0547089-A1 POLYOLEFIN MOULDING MATERIAL FOR THE PRODUCTION OF CALENDERED SHEET HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-23 EP claimed
EP-0545397-A1 Miscible blends of poly (alkylene oxide) vinyl carboxylic ester polymers and acidic functional polymers EASTMAN CHEMICAL COMPANY (US) 1993-06-09 EP claimed
WO-1992004403-A1 POLYOLEFIN MOULDING MATERIAL FOR THE PRODUCTION OF CALENDERED SHEET HOECHST AKTIENGESELLSCHAFT (DE) 1992-03-19 WO claimed
EP-0184044-B1 LIGHT-SENSITIVE COMPOSITION, REGISTRATION MATERIAL PREPARED THEREOF, AND PROCESS FOR OBTAINING HEAT-RESISTANT RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-15 EP claimed
US-4699867-A Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups HOECHST AKTIENGESELLSCHAFT (DE) 1987-10-13 US claimed
US-4691057-A Process for making alkali metal aryloxides ETHYL CORPORATION (US) 1987-09-01 US claimed
EP-0184044-A2 Light-sensitive composition, registration material prepared thereof, and process for obtaining heat-resistant relief images HOECHST AKTIENGESELLSCHAFT (DE) 1986-06-11 EP claimed