SCHEMBL4141489

SCHEMBL4141489

CC(C)O[Si](CCCn1c(=O)[nH]c(=O)[nH]c1=O)(OC(C)C)OC(C)C

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
PDE4A P27815 2/20 0.33
ADORA2A P29274 2/20 0.33
PDE4B Q07343 2/20 0.33
PDE4C Q08493 2/20 0.33
PDE4D Q08499 2/20 0.33
ADORA3 P0DMS8 1/20 0.33
ADORA2B P29275 1/20 0.33
TLR7 Q9NYK1 1/20 0.32
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4117056 0.87 APEX1 (0.39) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL557549 0.81 ADORA2B (0.35) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL4120385 0.81 RGS4 (0.30)
SCHEMBL4129111 0.79 ADORA2B (0.36) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL21357959 0.78 ADORA2B (0.36) ADORA2AADORA3ADORA2BMEN1KMT2A
SCHEMBL28636308 0.77 ALDH1A1 (0.32) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL22472307 0.76 ADORA2B (0.38) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL22472338 0.75 ADORA2B (0.40) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL28429834 0.73 PDE4A (0.34) PDE4AADORA2APDE4BPDE4CPDE4D
SCHEMBL9681087 0.71 ADORA2B (0.35) PDE4AADORA2APDE4BPDE4CPDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116981751-A Adhesive paste, method for using adhesive paste, and method for manufacturing semiconductor device 琳得科株式会社 2023-10-31 CN disclosed
CN-112739775-B Curable composition, cured product, and method for using curable composition 琳得科株式会社 2022-11-01 CN disclosed
CN-112739776-B Curable composition, cured product, and method for using curable composition 琳得科株式会社 2022-10-28 CN disclosed
CN-115124973-A Adhesive paste, method for using adhesive paste, and method for manufacturing semiconductor device 琳得科株式会社 2022-09-30 CN disclosed
CN-112739748-B Curable polysilsesquioxane compound, curable composition, cured product, and method for using curable composition 琳得科株式会社 2022-07-12 CN disclosed
CN-108473767-B Curable composition, method for producing curable composition, cured product, and method for using curable composition 琳得科株式会社 2021-07-13 CN disclosed
CN-108368346-B Curable composition, method for producing curable composition, cured product, method for using curable composition, and optical device 琳得科株式会社 2021-07-13 CN disclosed
CN-112739748-A Curable polysilsesquioxane compound, curable composition, cured product, and method for using curable composition 琳得科株式会社 2021-04-30 CN disclosed
CN-112739775-A Curable composition, cured product, and method for using curable composition 琳得科株式会社 2021-04-30 CN disclosed
CN-112739776-A Curable composition, cured product, and method for using curable composition 琳得科株式会社 2021-04-30 CN disclosed
WO-2020067451-A1 CURABLE POLYSILSESQUIOXANE COMPOUND, CURABLE COMPOSITION, CURED PRODUCT, AND, METHOD FOR USING CURABLE COMPOSITION リンテック株式会社 2020-04-02 WO disclosed
WO-2019176828-A1 CURABLE COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR USING CURABLE COMPOSITION リンテック株式会社 2019-09-19 WO disclosed
EP-2684690-B1 ADHESIVE-BONDED STRUCTURE COMPRISING BOTH ADHESIVE COMPOSITION AND WOOD MATERIAL KANEKA CORP (JP) 2018-02-21 EP disclosed
EP-1418021-B1 Polishing pad JSR CORP (JP) 2009-01-21 EP disclosed
EP-1348747-B1 Gas barrier coating composition and method for manufacturing same JSR CORP (JP) 2007-02-14 EP disclosed
US-6992123-B2 Polishing pad JSR CORPORATION (JP) 2006-01-31 US disclosed
US-20040118051-A1 Polishing pad JSR CORPORATION (JP) 2004-06-24 US disclosed
EP-1418021-A1 Polishing pad JSR Corporation (JP) 2004-05-12 EP disclosed
US-20030187113-A1 Gas barrier coating composition and method for manufacturing same JSR CORPORATION (JP) 2003-10-02 US disclosed
EP-1348747-A1 Gas barrier coating composition and method for manufacturing same JSR Corporation (JP) 2003-10-01 EP disclosed