Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 7/20 | 0.43 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | GPR3 | P46089 | 2/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | CASP1 | P29466 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL30925713 | 0.98 | ENPP2 (0.44) | KCNH2ENPP2LMNAGPR3CA12 | |
| Sulfuric Acid SCHEMBL3625673 | 0.86 | ENPP2 (0.48) | ENPP2LMNACA12CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2350092 | 0.85 | KCNH2 (0.42) | KCNH2ENPP2LMNAGPR3CA12 | |
| SCHEMBL29714721 | 0.84 | ENPP2 (0.52) | ENPP2LMNACA12CA1CA2 | |
| Sulfuric Acid SCHEMBL3625678 | 0.84 | LMNA (0.48) | ENPP2LMNACA12CA1CA2 | |
| SCHEMBL5856324 | 0.84 | CA1 (0.36) | KCNH2ENPP2LMNACA12CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL562050 | 0.83 | GPR3 (0.43) | KCNH2GPR3CA12CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL31028107 | 0.83 | KCNH2 (0.43) | KCNH2ENPP2LMNAGPR3ESR1 | |
| SCHEMBL5857309 | 0.82 | CA2 (0.38) | KCNH2ENPP2CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL30536270 | 0.81 | ACHE (0.43) | GPR3CA1CA2CA9ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12434998-B2 | Resin-coated ultra-thin glass | TORAY INDUSTRIES, INC. (JP) | 2025-10-07 | — | — | US | disclosed |
| CN-114730132-B | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin | 富士胶片株式会社 | 2025-05-09 | — | — | CN | disclosed |
| WO-2025075065-A1 | THERMALLY CATIONICALLY POLYMERIZABLE COMPOSITION, USE OF SAME, CATIONIC POLYMERIZATION METHOD USING SAME, AND STABILIZER FOR THERMALLY CATIONICALLY POLYMERIZABLE COMPOSITIONS | 三新化学工業株式会社 | 2025-04-10 | — | — | WO | disclosed |
| CN-116648353-B | Resin coated ultra-thin plate glass and display device | 东丽株式会社 | 2025-01-21 | — | — | CN | disclosed |
| CN-114761466-B | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin | 富士胶片株式会社 | 2024-12-10 | — | — | CN | disclosed |
| CN-114008527-B | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and polyimide or polyimide precursor | 富士胶片株式会社 | 2024-11-01 | — | — | CN | disclosed |
| CN-118307457-A | Preparation method of (4- (acryloyloxy) phenyl) dimethyl sulfonium trifluoro methanesulfonate | 东南大学 | 2024-07-09 | — | — | CN | disclosed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024057999-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, DISPLAY DEVICE AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2024-03-21 | — | — | WO | disclosed |
| US-20230365458-A1 | RESIN-COATED ULTRA-THIN GLASS | TORAY INDUSTRIES, INC. (JP) | 2023-11-16 | — | — | US | disclosed |
| EP-0432599-B1 | Light-sensitive composition, and process for the formation of relief patterns | BASF AG (DE) | 1997-03-19 | — | — | EP | disclosed |
| EP-0762207-A2 | Positive working photosensitive composition and method of producing relief structures | BASF AKTIENGESELLSCHAFT (DE) | 1997-03-12 | — | — | EP | disclosed |
| US-5389494-A | Radiation-sensitive mixture and production of relief images | BASF AKTIENGESELLSCHAFT (DE) | 1995-02-14 | — | — | US | disclosed |
| EP-0616258-A1 | Radiation sensitive composition and process for forming relief structures with improved contrast | BASF Aktiengesellschaft (DE) | 1994-09-21 | — | — | EP | disclosed |
| EP-0553737-A1 | Radiation-sensitive composition | BASF Aktiengesellschaft (DE) | 1993-08-04 | — | — | EP | disclosed |
| US-5151341-A | RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RELIEF STRUCTURES | BASF AKTIENGESELLSCHAFT, (DE) | 1992-09-29 | — | — | US | disclosed |
| US-5110708-A | RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1992-05-05 | — | — | US | disclosed |
| EP-0432599-A2 | Light-sensitive composition, and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1991-06-19 | — | — | EP | disclosed |
| EP-0424737-A2 | Light-sensitive composition, and process for the formation of relief pattern | BASF Aktiengesellschaft (DE) | 1991-05-02 | — | — | EP | disclosed |
| EP-0424766-A2 | Radiation-sensitive composition and process for the formation of relief patterns | BASF Aktiengesellschaft (DE) | 1991-05-02 | — | — | EP | disclosed |