Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | ACHE | P22303 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | CES1 | P23141 | 1/20 | 0.50 |
| ▸ | PLAU | P00749 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 3/20 | 0.48 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA3 | P07451 | 1/20 | 0.48 |
| ▸ | CA4 | P22748 | 1/20 | 0.48 |
| ▸ | CA6 | P23280 | 1/20 | 0.48 |
| ▸ | CA5A | P35218 | 1/20 | 0.48 |
| ▸ | CA7 | P43166 | 1/20 | 0.48 |
| ▸ | CA9 | Q16790 | 1/20 | 0.48 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL11060473 | 0.97 | ALDH1A1 (0.52) | ALDH1A1HSD17B10ACHELMNACES1 | |
| SCHEMBL426370 | 0.91 | ALDH1A1 (0.62) | ALDH1A1HSD17B10ACHELMNACES1 | |
| SCHEMBL31058175 | 0.91 | ALDH1A1 (0.46) | ALDH1A1HSD17B10ACHELMNACES1 | |
| Hydrochloric Acid SCHEMBL31093480 | 0.89 | ALDH1A1 (0.60) | ALDH1A1HSD17B10ACHELMNACES1 | |
| SCHEMBL31145688 | 0.89 | ALDH1A1 (0.60) | ALDH1A1HSD17B10ACHELMNACES1 | |
| SCHEMBL9643965 | 0.89 | CES1 (0.47) | ALDH1A1HSD17B10ACHELMNACES1 | |
| SCHEMBL12770149 | 0.89 | ACHE (0.75) | ALDH1A1HSD17B10ACHELMNARECQL | |
| SCHEMBL31058260 | 0.84 | TSHR (0.57) | ALDH1A1ACHELMNACES1TDP1 | |
| SCHEMBL22567 | 0.83 | ALDH1A1 (0.72) | ALDH1A1HSD17B10ACHELMNACES1 | |
| SCHEMBL27909482 | 0.83 | ALDH1A1 (0.72) | ALDH1A1HSD17B10ACHELMNACES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260044074-A1 | ACCEPTOR-SUBSTITUTED EUV PAGS WITH HIGH ELECTRON AFFINITY | MERCK PATENT GMBH (DE) | 2026-02-12 | — | — | US | disclosed |
| CN-119798564-A | Photopolymer holographic recording medium, grating, preparation method and equipment thereof | 珠海莫界科技有限公司 | 2025-04-11 | — | — | CN | disclosed |
| WO-2024175523-A1 | ACCEPTOR-SUBSTITUTED EUV PAGS WITH HIGH ELECTRON AFFINITY | MERCK PATENT GMBH (DE) | 2024-08-29 | — | — | WO | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9188858-B2 | Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound | JSR CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9152044-B2 | — | — | 2015-10-06 | — | — | US | disclosed |
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-7956142-B2 | Polymerizable sulfonic acid onium salt and resin | JSR CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110014569-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100255420-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100040977-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| EP-0085024-B1 | METHOD FOR PRODUCING IMAGES IN PHOTORESIST LAYERS | CIBA-GEIGY AG (CH) | 1987-07-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | ALDH1A1 2200/4885HSD17B10 1774/4885ACHE 4760/4885 |
| US-20260044074-A1 | ACCEPTOR-SUBSTITUTED EUV PAGS WITH HIGH ELECTRON AFFINITY | ETV6, PAG1, ETV1 | ALDH1A1 3662/4885HSD17B10 3845/4885ACHE 4585/4885 |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | ALDH1A1 3298/4885HSD17B10 2280/4885ACHE 4863/4885 |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | ASIC1, FGFR1, PFAS | ALDH1A1 1719/4885HSD17B10 1958/4885ACHE 4797/4885 |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | RER1, ASIC1, GAR1 | ALDH1A1 1136/4885HSD17B10 2491/4885ACHE 4348/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.