Sugi Predict

Sugi Predict / Compounds / SCHEMBL426363

SCHEMBL426363

SCHEMBL426363

CC(C)Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.47
▸ ALDH1A3 P47895 1/20 0.44
▸ ALDH1A1 P00352 3/20 0.44
▸ MEN1 O00255 3/20 0.44
▸ GAA P10253 2/20 0.44
▸ LMNA P02545 2/20 0.44
▸ TP53 P04637 2/20 0.44
▸ POLB P06746 1/20 0.43
▸ PARP10 Q53GL7 1/20 0.41
▸ CNR2 P34972 2/20 0.41
▸ NPC1 O15118 1/20 0.41
▸ RAB9A P51151 1/20 0.41
▸ CYP1A2 P05177 1/20 0.39
▸ CYP2C9 P11712 1/20 0.39
▸ PKM P14618 1/20 0.39
▸ CYP2C19 P33261 1/20 0.39
▸ FGFR1 P11362 1/20 0.38
▸ GLA P06280 1/20 0.38
▸ PTPN5 P54829 1/20 0.37
▸ CYP3A4 P08684 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13131057 0.82 FFAR1 (0.50) POLB
SCHEMBL12394 0.79 KMT2A (0.54) KMT2AALDH1A3ALDH1A1MEN1GAA
SCHEMBL2569744 0.77 CYP1A2 (0.33) GAACYP1A2CYP2C9PKMCYP2C19
SCHEMBL3195400 0.77 ALDH1A1 (0.40) KMT2AALDH1A1MEN1GAALMNA
Phosphine SCHEMBL28772208 0.77 KMT2A (0.52) KMT2AALDH1A3ALDH1A1MEN1GAA
Hydrogen Sulfide SCHEMBL27992657 0.77 KMT2A (0.52) KMT2AALDH1A3ALDH1A1MEN1GAA
Ammonia Solution, Strong SCHEMBL8909178 0.77 KMT2A (0.52) KMT2AALDH1A3ALDH1A1MEN1GAA
Hydrogen Peroxide SCHEMBL28902806 0.77 KMT2A (0.70) KMT2AALDH1A3ALDH1A1MEN1GAA
SCHEMBL125543 0.76 ALDH1A3 (0.64) KMT2AALDH1A3ALDH1A1MEN1GAA
SCHEMBL13052211 0.76 MAOA (0.39) LMNATP53NPC1CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760004-B2 Radiation-sensitive resin composition and resist pattern-forming method JSR CORPORATION (JP) 2017-09-12 — — US disclosed
US-9760004-B2 Radiation-sensitive resin composition and resist pattern-forming method JSR CORPORATION (JP) 2017-09-12 — — US disclosed
US-20170038679-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND JSR CORPORATION (JP) 2017-02-09 — — US disclosed
US-20170038679-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND JSR CORPORATION (JP) 2017-02-09 — — US disclosed
US-9523911-B2 Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound JSR CORPORATION (JP) 2016-12-20 — — US disclosed
US-9188858-B2 Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound JSR CORPORATION (JP) 2015-11-17 — — US disclosed
US-9152044-B2 — — 2015-10-06 — — US disclosed
US-9122154-B2 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2015-09-01 — — US disclosed
US-9104102-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2015-08-11 — — US disclosed
US-20150093703-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-04-02 — — US disclosed
US-7897821-B2 Sulfonium compound JSR CORPORATION (JP) 2011-03-01 — — US disclosed
US-20110014569-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER JSR CORPORATION (JP) 2011-01-20 — — US disclosed
US-20100324329-A1 COMPOUND JSR CORPORATION (JP) 2010-12-23 — — US disclosed
US-7812105-B2 Compound, polymer, and radiation-sensitive composition JSR CORPORATION (JP) 2010-10-12 — — US disclosed
US-20100255420-A1 RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER JSR CORPORATION (JP) 2010-10-07 — — US disclosed
US-20100221659-A1 COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-02 — — US disclosed
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR CORPORATION (JP) 2010-03-11 — — US disclosed
US-20100040977-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-18 — — US disclosed
US-20090069521-A1 Novel Compound, Polymer, and Radiation-Sensitive Composition JSR CORPORATION (JP) 2009-03-12 — — US disclosed
US-20070054214-A1 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions JSR CORPORATION (JP) 2007-03-08 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN ASIC1, RER1, RPS10 KMT2A 1765/4885ALDH1A3 1796/4885ALDH1A1 2200/4885
US-20100324329-A1 COMPOUND AFF2, AFF1, AFF4 KMT2A 1618/4885ALDH1A3 4063/4885ALDH1A1 2783/4885
US-20090069521-A1 Novel Compound, Polymer, and Radiation-Sensitive Composition MRE11, RAD51, MRPS22 KMT2A 884/4885ALDH1A3 4045/4885ALDH1A1 4458/4885
US-20100221659-A1 COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION AFF1, RER1, AFF4 KMT2A 683/4885ALDH1A3 3825/4885ALDH1A1 3298/4885
US-20170038679-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND RER1, ASIC1, GAR1 KMT2A 2060/4885ALDH1A3 1146/4885ALDH1A1 1136/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.