⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28242776 | 0.85 | — | — | |
| SCHEMBL20522948 | 0.71 | — | — | |
| SCHEMBL230819 | 0.69 | — | — | |
| SCHEMBL329203 | 0.69 | HTT (0.32) | — | |
| SCHEMBL1448901 | 0.69 | HTT (0.32) | — | |
| SCHEMBL9845415 | 0.69 | — | — | |
| SCHEMBL431586 | 0.69 | — | — | |
| SCHEMBL359593 | 0.68 | MGLL (0.31) | — | |
| SCHEMBL17553085 | 0.67 | — | — | |
| SCHEMBL23866514 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2006138131-A1 | METHOD FOR SILICON NITRIDE CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2006-12-28 | — | — | WO | claimed |
| WO-2008077020-A2 | SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BORON IMPLANTED WAFERS | APPLIED MATERIALS, INC. (US) | 2008-06-26 | — | — | WO | disclosed |
| WO-2007002040-A2 | METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS | APPLIED MATERIALS, INC. (US) | 2007-01-04 | — | — | WO | disclosed |
| WO-2006138131-A1 | METHOD FOR SILICON NITRIDE CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2006-12-28 | — | — | WO | disclosed |