Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC9A1 | P19634 | 8/20 | 0.62 |
| ▸ | EGLN3 | Q9H6Z9 | 2/20 | 0.59 |
| ▸ | MAPT | P10636 | 3/20 | 0.58 |
| ▸ | RAB9A | P51151 | 3/20 | 0.58 |
| ▸ | NPC1 | O15118 | 2/20 | 0.58 |
| ▸ | GLA | P06280 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.53 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.51 |
| ▸ | APAF1 | O14727 | 1/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | MGAM | O43451 | 1/20 | 0.50 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | SI | P14410 | 1/20 | 0.50 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.50 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29755652 | 1.00 | SLC9A1 (0.62) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL18373283 | 0.83 | SLC9A1 (0.67) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL972935 | 0.82 | APAF1 (0.62) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL2936169 | 0.80 | SLC9A1 (0.68) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL14796568 | 0.80 | SLC9A1 (0.79) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL28881718 | 0.79 | MGAM (0.53) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL13780815 | 0.79 | SLC9A1 (0.66) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL7667067 | 0.77 | SLC9A1 (0.70) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL29482278 | 0.77 | SLC9A1 (0.70) | SLC9A1EGLN3MAPTRAB9ANPC1 | |
| SCHEMBL10248342 | 0.77 | SLC9A1 (0.69) | SLC9A1EGLN3MAPTRAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 277 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114016031-B | Quick etching liquid and preparation method thereof | 深圳市松柏实业发展有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-114016031-A | Fast etching liquid and preparation method thereof | 深圳市松柏实业发展有限公司 | 2022-02-08 | — | — | CN | claimed |
| CN-107406752-B | Polishing agent, stock solution for polishing agent, and polishing method | 日立化成株式会社 | 2020-05-08 | — | — | CN | claimed |
| CN-102318042-B | Polishing agent for polishing copper and polishing method using same | HITACHI CHEMICAL CO LTD | 2015-07-01 | — | — | CN | claimed |
| US-20070128872-A1 | Polishing composition and polishing method | SHOWA DENKO K.K. (JP) | 2007-06-07 | — | — | US | claimed |
| CN-1902291-A | Polishing composition and polishing method | SHOWA DENKO KK (JP) | 2007-01-24 | — | — | CN | claimed |
| EP-1687387-A1 | POLISHING COMPOSITION COMPRISING PHOSPHATE ESTERS AND POLISHING METHOD | Showa Denko K.K. (JP) | 2006-08-09 | — | — | EP | claimed |
| WO-2005047409-A1 | POLISHING COMPOSITION AND POLISHING METHOD | SHOWA DENKO K.K. (JP) | 2005-05-26 | — | — | WO | claimed |
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | FUJIFILM CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12516420-B2 | Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12480077-B2 | Aqueous cleaning liquid and method of cleaning electronic device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12480072-B2 | Cleaning fluid and cleaning method | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-20250215126-A1 | COMPOSITION, SUBSTRATE TREATMENT METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2003104350-A1 | METAL POLISH COMPOSITION, POLISHING METHOD USING THE COMPOSITION AND METHOD FOR PRODUCING WAFER USING THE POLISHING METHOD | SHOWA DENKO K.K. (JP) | 2003-12-18 | — | — | WO | disclosed |
| US-20030219982-A1 | CMP (chemical mechanical polishing) polishing liquid for metal and polishing method | HITACHI CHEMICAL CO., LTD (JP) | 2003-11-27 | — | — | US | disclosed |
| EP-1223609-A1 | POLISHING COMPOUND FOR CHEMIMECHANICAL POLISHING AND POLISHING METHOD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-07-17 | — | — | EP | disclosed |
| US-20020017630-A1 | Abrasive liquid for metal and method for polishing | RENESAS ELECTRONICS CORPORATION (JP) | 2002-02-14 | — | — | US | disclosed |
| EP-1150341-A1 | MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1137056-A1 | ABRASIVE LIQUID FOR METAL AND METHOD FOR POLISHING | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260146199-A1 | METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE | AS3MT, ASH1L, HMOX2 | SLC9A1 854/4885EGLN3 1170/4885MAPT 976/4885 |
| US-12588450-B2 | Post-CMP cleaning liquid comprising a substituted benzene anticorrosive agent, chelant, and amine compound | SSRP1, H1-5, AOC1 | SLC9A1 1507/4885EGLN3 3488/4885MAPT 4797/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.