SCHEMBL4415593

SCHEMBL4415593

O=S(=O)(Cl)C(F)(F)C(F)(F)C1CC2CCC1C2

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
HSP90AA1 P07900 1/20 0.33
CNR2 P34972 1/20 0.32
ALDH1A1 P00352 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
CYP19A1 P11511 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13636515 0.82 ALDH1A1 (0.34) CNR2ALDH1A1
SCHEMBL16385622 0.82 CNR2 (0.32) CNR2CYP19A1
SCHEMBL14491221 0.82 CNR2 (0.32) CNR2CYP19A1
SCHEMBL14040417 0.82 CNR2 (0.32) CNR2CYP19A1
SCHEMBL97345 0.82 CNR2 (0.32) CNR2CYP19A1
SCHEMBL4994429 0.81 HSP90AA1 (0.32) HSP90AA1CNR2
SCHEMBL4995636 0.81 CNR2 (0.32) CNR2
SCHEMBL27816439 0.79 HSP90AA1 (0.33) HSP90AA1CNR2CYP19A1
SCHEMBL16358450 0.78 CNR2 (0.30) CNR2
SCHEMBL17068030 0.78 SLC6A3 (0.31) HSP90AA1CNR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1270553-B1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORP (JP) 2009-11-18 EP disclosed
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
CN-1916760-A Acid generator, sulfonic acid derivative and radiation-sensitive resin composition JSR CORP (JP) 2007-02-21 CN disclosed
CN-1276303-C Acid generator and radiation-sensitive resin composition JSR CORP (JP) 2006-09-20 CN disclosed
US-6908722-B2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-06-21 US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed
CN-1432873-A Acid generator, sulfonic acid derivative and radiation-sensitive resin composition JSR CORP (JP) 2003-07-30 CN disclosed
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORPORATION (JP) 2003-06-19 US disclosed
EP-1270553-A2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR Corporation (JP) 2003-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition ASIC1, PFAS, RARA HSP90AA1 377/4885CNR2 1899/4885ALDH1A1 1216/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.