Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | GPX4 | P36969 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9926618 | 0.89 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL13328133 | 0.88 | GPX4 (0.35) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL92589 | 0.87 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL13938556 | 0.87 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL13939249 | 0.86 | KDM4E (0.35) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL13375783 | 0.86 | — | — | |
| SCHEMBL13588293 | 0.85 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL13588294 | 0.84 | CHRM2 (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL6732360 | 0.83 | OPRM1 (0.32) | OPRM1OPRK1 | |
| SCHEMBL13330273 | 0.82 | GPX4 (0.34) | KDM4ENPC1POLBMAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8507575-B2 | Radiation-sensitive resin composition, polymer, and compound | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-7629106-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-08 | — | — | US | disclosed |
| US-20090297979-A1 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-7491483-B2 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-17 | — | — | US | disclosed |
| US-7449277-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL C., LTD (JP) | 2008-11-11 | — | — | US | disclosed |
| US-7368218-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7368218-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| EP-1767539-A1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL COMPANY, LTD. (JP) | 2007-03-28 | — | — | EP | disclosed |
| US-7144675-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-12-05 | — | — | US | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | AOC2, ODC1, MCM7 | KDM4E 2865/4885NPC1 2990/4885POLB 309/4885 |
| US-20090297979-A1 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | PRRC2A, PUF60, POLR2B | KDM4E 1128/4885NPC1 4815/4885POLB 554/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.