SCHEMBL4440485

SCHEMBL4440485

COC(=O)c1ccccc1Sc1ccccc1C(=O)OC

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.64
POLB P06746 2/20 0.64
MAPT P10636 3/20 0.62
PKLR P30613 1/20 0.59
TSHR P16473 3/20 0.59
LMNA P02545 2/20 0.59
ALDH1A1 P00352 2/20 0.57
CFTR P13569 1/20 0.57
KDM4E B2RXH2 2/20 0.55
ATM Q13315 1/20 0.55
TDP1 Q9NUW8 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
KMT2A Q03164 2/20 0.52
HTT P42858 1/20 0.52
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA5A P35218 1/20 0.50
CA9 Q16790 1/20 0.50
ALOX15 P16050 1/20 0.50
SLC6A3 Q01959 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10507547 0.89 HSD17B10 (0.54) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL21743616 0.89 HSD17B10 (0.54) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL1340573 0.89 ALDH1A1 (0.66) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL5887723 0.89 SIRT1 (0.61) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL30096217 0.88 POLB (0.64) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL756511 0.88 POLB (0.64) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL7754027 0.86 HSD17B10 (0.62) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL647041 0.86 TSHR (0.71) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL4448426 0.85 SLC6A4 (0.51) HSD17B10POLBMAPTPKLRTSHR
SCHEMBL11091481 0.85 L3MBTL1 (0.54) HSD17B10POLBMAPTPKLRTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4047418-B1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2023-08-16 EP disclosed
EP-4047417-B1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2023-08-16 EP disclosed
US-20220155687-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-05-19 US disclosed
CN-110483349-B Preparation method of alkyl thioether 中国科学院兰州化学物理研究所 2021-01-12 CN disclosed
EP-2061754-A1 BIARYL AND BIHETEROARYL COMPOUNDS USEFUL IN TREATING IRON DISORDERS XENON PHARMACEUTICALS INC. (CA) 2009-05-27 EP disclosed
WO-2008115999-A1 BIARYL AND BIHETEROARYL COMPOUNDS USEFUL IN TREATING IRON DISORDERS XENON PHARMACEUTICALS INC. (CA) 2008-09-25 WO disclosed
US-20080234384-A1 BIARYL AND BIHETEROARYL COMPOUNDS USEFUL IN TREATING IRON DISORDERS XENON PHARMACEUTICALS INC. (CA) 2008-09-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080234384-A1 BIARYL AND BIHETEROARYL COMPOUNDS USEFUL IN TREATING IRON DISORDERS FECH, SLC10A1, SLC40A1 HSD17B10 414/4885POLB 2907/4885MAPT 661/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.