Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 4/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6725888 | 0.81 | TSHR (0.34) | ALDH1A1TSHRCYP3A4 | |
| SCHEMBL20505722 | 0.77 | ALDH1A1 (0.56) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL12121052 | 0.76 | ALDH1A1 (0.37) | ALDH1A1TSHR | |
| SCHEMBL11019148 | 0.75 | MAOA (0.32) | — | |
| SCHEMBL10159624 | 0.75 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL12903287 | 0.74 | ALDH1A1 (0.64) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL447739 | 0.72 | ALDH1A1 (0.55) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL5796626 | 0.71 | PRKCA (0.33) | — | |
| SCHEMBL445031 | 0.71 | ALDH1A1 (0.58) | ALDH1A1TSHRCYP3A4CYP2D6CYP2C19 | |
| SCHEMBL11070637 | 0.70 | CYP1A2 (0.38) | ALDH1A1TSHRCYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| CN-102804065-B | Radiation-sensitive resin composition | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| US-8778575-B2 | Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element | FUJIFILM CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8778575-B2 | Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element | FUJIFILM CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8507575-B2 | Radiation-sensitive resin composition, polymer, and compound | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-20120094234-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| CN-102099749-A | Positive-type radiation-sensitive composition, and resist pattern formation method | JSR CORP | 2011-06-15 | — | — | CN | disclosed |
| CN-101772735-A | Radiation sensitive resin composition | JSR CORP | 2010-07-07 | — | — | CN | disclosed |
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-7531286-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7531286-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20080171272-A1 | CURABLE COMPOSITION, COLOR FILTER USING THE SAME AND MANUFACTUIRNG METHOD THEREFOR, AND SOLID IMAGE PICKUP ELEMENT | FUJIFILM CORPORATION (JP) | 2008-07-17 | — | — | US | disclosed |
| US-20080171272-A1 | CURABLE COMPOSITION, COLOR FILTER USING THE SAME AND MANUFACTUIRNG METHOD THEREFOR, AND SOLID IMAGE PICKUP ELEMENT | FUJIFILM CORPORATION (JP) | 2008-07-17 | — | — | US | disclosed |
| EP-1767539-A1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL COMPANY, LTD. (JP) | 2007-03-28 | — | — | EP | disclosed |
| US-7144675-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-12-05 | — | — | US | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | AOC2, ODC1, MCM7 | ALDH1A1 1542/4885TSHR 2137/4885CYP3A4 501/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.