Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | MGAM | O43451 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | SI | P14410 | 1/20 | 0.36 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.36 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | BLM | P54132 | 1/20 | 0.34 |
| ▸ | WRN | Q14191 | 1/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2700961 | 0.96 | NAAA (0.35) | NAAAMAPTMGAMGAASI | |
| SCHEMBL27625736 | 0.87 | TSHR (0.38) | NAAAMAPTMGAMGAASI | |
| SCHEMBL5918169 | 0.83 | NAAA (0.44) | NAAAMAPTGAALMNAALDH1A1 | |
| SCHEMBL2586982 | 0.83 | TSHR (0.38) | MAPTMGAMGAASIMGAM2 | |
| SCHEMBL9936248 | 0.83 | MAPT (0.34) | MAPTMGAMGAASIMGAM2 | |
| SCHEMBL1464838 | 0.83 | TDP1 (0.50) | NAAAMAPTLMNAALDH1A1CYP1A2 | |
| SCHEMBL27646329 | 0.83 | MAPT (0.46) | MAPTLMNAALDH1A1CYP1A2TSHR | |
| SCHEMBL1469447 | 0.82 | ALDH1A1 (0.48) | MAPTMGAMGAASIMGAM2 | |
| SCHEMBL9936908 | 0.82 | TSHR (0.35) | MAPTMGAMGAASIMGAM2 | |
| SCHEMBL6062167 | 0.82 | NAAA (0.34) | NAAAMAPTLMNAALDH1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 387 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9472813-B2 | Battery electrolyte solution containing certain ester-based solvents, and batteries containing such an electrolyte solution | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-10-18 | — | — | US | claimed |
| CN-104536265-A | Photoresist composition | ZHEJIANG YONGTAI TECHNOLOGY CO LTD | 2015-04-22 | — | — | CN | claimed |
| CN-103857751-A | Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film | DONGWOO FINE CHEM CO LTD | 2014-06-11 | — | — | CN | claimed |
| EP-2652832-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | Dow Global Technologies LLC (US) | 2013-10-23 | — | — | EP | claimed |
| US-20130260229-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-10-03 | — | — | US | claimed |
| WO-2012082760-A1 | BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-06-21 | — | — | WO | claimed |
| CN-101044435-B | Photosensitive composition removing liquid | SHOWA DENKO KK | 2010-09-08 | — | — | CN | claimed |
| CN-100429248-C | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2008-10-29 | — | — | CN | claimed |
| CN-101059653-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-10-24 | — | — | CN | claimed |
| CN-1693322-A | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | DONGJIN SAEMIGUNG CO LTD (KR) | 2005-11-09 | — | — | CN | claimed |
| US-20260133489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-05-14 | — | — | US | disclosed |
| US-20260063996-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260062515-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260003271-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-01-01 | — | — | US | disclosed |
| US-20250355351-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| CN-1427043-A | Particle, composition and protective film | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| CN-1427306-A | Radiation sensitive refractivity change composition and method for changing refractivity | JSR CORP (JP) | 2003-07-02 | — | — | CN | disclosed |
| CN-1414048-A | Solidified composition forming as protective membrane, forming method of the membrance and the membrane | JSR CORP (JP) | 2003-04-30 | — | — | CN | disclosed |
| CN-1388919-A | Composition having refractive index sensitively changealbe by radiation and method for forming refractive index pattern | JSR CORP (JP) | 2003-01-01 | — | — | CN | disclosed |
| US-4353710-A | ADDING ESTER OR ETHER OF METHANOL OR ETHANOL | TEXACO INC. (US) | 1982-10-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250355351-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | LCP1, CD79B, ARCN1 | NAAA 4165/4885MAPT 420/4885MGAM 3551/4885 |
| US-20260003271-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | KDM1A, KDM2A, KDM3A | NAAA 4112/4885MAPT 3396/4885MGAM 4697/4885 |
| US-20260133489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | ASH2L, RER1, ARCN1 | NAAA 4199/4885MAPT 2002/4885MGAM 4662/4885 |
| US-20260062515-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | RPS4Y1, ASH2L, KDM4D | NAAA 3847/4885MAPT 2819/4885MGAM 4772/4885 |
| US-20260063996-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | ASH2L, FCER2, TAS1R2 | NAAA 4529/4885MAPT 2580/4885MGAM 4471/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.