Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17503523 | 1.00 | CYP2D6 (0.36) | CYP2D6CYP2C19CYP19A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL448452 | 0.84 | — | — | |
| SCHEMBL6254118 | 0.82 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL5861860 | 0.78 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL5322625 | 0.75 | ALDH1A1 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL9705137 | 0.75 | CYP2D6 (0.37) | CYP2D6CYP2C19CYP19A1 | |
| SCHEMBL15781887 | 0.69 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL11740261 | 0.69 | MAOB (0.36) | — | |
| SCHEMBL17479537 | 0.69 | ELANE (0.40) | — | |
| SCHEMBL16034793 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 166 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9891546-B2 | Ultraviolet-curable liquid developer | CANON KABUSHIKI KAISHA (JP) | 2018-02-13 | — | — | US | claimed |
| US-9891547-B2 | Ultraviolet-curable liquid developer | CANON KABUSHIKI KAISHA (JP) | 2018-02-13 | — | — | US | claimed |
| US-9857716-B2 | Curable liquid developer and image-forming method using curable liquid developer | CANON KABUSHIKI KAISHA (JP) | 2018-01-02 | — | — | US | claimed |
| US-7045267-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-16 | — | — | US | claimed |
| US-6962768-B2 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-08 | — | — | US | claimed |
| US-6897005-B2 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2005-05-24 | — | — | US | claimed |
| US-6787287-B2 | LITHOGRAPHY CHARACTERISTICS WHEN USED AS PHOTORESIST MATERIAL | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-09-07 | — | — | US | claimed |
| US-20040170919-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2004-09-02 | — | — | US | claimed |
| US-20040137363-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | CHOI SANG-JUN (KR) | 2004-07-15 | — | — | US | claimed |
| US-6696217-B2 | ACRYLATED ESTER POLYMER | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-24 | — | — | US | claimed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | claimed |
| US-6673513-B2 | COPOLYMER OF MALEIC ANHYDRIDE AND ALKYL VINYL ETHER OR UNSATURATED OXYGEN CONTAINING RINGS SUCH AS 3,4-DIHYDRO-2H-PYRAN, AND TERPOLYMERS WITH ACRYLATE HAVING ACID LABILE HYDROCARBON GROUP; ETCH RESISTANCE, GOOD ADHESION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-01-06 | — | — | US | claimed |
| US-6627382-B2 | Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2003-09-30 | — | — | US | claimed |
| US-6596459-B1 | Photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-22 | — | — | US | claimed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | claimed |
| US-20020177067-A1 | Fluoro-containing photosensitive polymer and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2002-11-28 | — | — | US | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020146642-A1 | Photosensitive polymers and resist compositions comprising the photosensitive polymers | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-10 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040170919-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | EEF1D, MACF1, YTHDF2 | CYP2D6 1948/4885CYP2C19 1379/4885CYP19A1 2149/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.