Tetrahydrothiophene

Tetrahydrothiophene

SCHEMBL4489545

C1CCSC1.CC(C)(C)C(=O)CBr

nearest known ligand 0.31

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL112282 0.81
Tetrahydrothiophene SCHEMBL9620648 0.67
SCHEMBL8677795 0.67 TRPA1 (0.43) TRPA1
SCHEMBL23643863 0.66
Acetone SCHEMBL7399782 0.65 LMNA (0.40)
Acetone SCHEMBL7399779 0.65 LMNA (0.40)
SCHEMBL180091 0.65 TRPA1 (0.44) TRPA1
Tetrahydrothiophene SCHEMBL9158780 0.65
Deanol SCHEMBL16685461 0.64 MEN1 (0.33)
Propionic Acid SCHEMBL27494376 0.64 FFAR3 (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7576223-B2 Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-18 US disclosed
US-20080269506-A1 Chemical amplification type resist composition YAMADA AIRI 2008-10-30 US disclosed
US-7396899-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL CO., LTD. (JP) 2008-07-08 US disclosed
US-20070123674-A1 Chemical amplification type resist composition YAMADA AIRI 2007-05-31 US disclosed
US-7160669-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-09 US disclosed
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040138353-A1 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-07-15 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080269506-A1 Chemical amplification type resist composition ASIC1, POLR2B, POLR2A TRPA1 1218/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.