Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | GPX4 | P36969 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17878802 | 0.84 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL18774894 | 0.83 | ALDH1A1 (0.36) | ALDH1A1KDM4EGPX4 | |
| SCHEMBL17882139 | 0.78 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL346391 | 0.77 | — | — | |
| SCHEMBL27196294 | 0.77 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL449341 | 0.74 | KDM4E (0.40) | ALDH1A1KDM4ECYP3A4HPGDHSD17B10 | |
| SCHEMBL20776848 | 0.71 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL17404435 | 0.71 | SMN1; SMN2 (0.36) | ALDH1A1KDM4ECYP3A4 | |
| SCHEMBL15759088 | 0.70 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL28225564 | 0.70 | ALDH1A1 (0.42) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9862695-B2 | Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound | DAICEL CORPORATION (JP) | 2018-01-09 | — | — | US | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9346775-B2 | Method for manufactruring β-(meth)acryloyloxy-γ-butyrolactones | JNC CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-20160060374-A1 | MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20150126753-A1 | METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES | JNC CORPORATION (JP) | 2015-05-07 | — | — | US | disclosed |
| EP-2503392-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8637623-B2 | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-01-28 | — | — | US | disclosed |
| US-8507575-B2 | Radiation-sensitive resin composition, polymer, and compound | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20040146802-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-29 | — | — | US | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | ALDH1A1 1006/4885KDM4E 143/4885CYP3A4 2518/4885 |
| US-20160060374-A1 | MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND | CNKSR1, NMRAL1, CCNA1 | ALDH1A1 2601/4885KDM4E 3086/4885CYP3A4 1338/4885 |
| US-20150126753-A1 | METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES | MCCC2, ACR, MMAB | ALDH1A1 414/4885KDM4E 145/4885CYP3A4 1580/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.