Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 3/20 | 0.33 |
| ▸ | MMP1 | P03956 | 3/20 | 0.33 |
| ▸ | MMP2 | P08253 | 3/20 | 0.33 |
| ▸ | MMP9 | P14780 | 3/20 | 0.33 |
| ▸ | MMP8 | P22894 | 3/20 | 0.33 |
| ▸ | MMP13 | P45452 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4491532 | 0.99 | CA2 (0.35) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6551426 | 0.99 | CA1 (0.33) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6551515 | 0.97 | CA1 (0.34) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6723098 | 0.88 | CA1 (0.31) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6728304 | 0.88 | CA1 (0.31) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6731889 | 0.87 | CA1 (0.33) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6723112 | 0.87 | CA1 (0.33) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6726173 | 0.87 | CA1 (0.30) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6551529 | 0.86 | CA1 (0.35) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6730765 | 0.86 | CA1 (0.32) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7576223-B2 | Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20080269506-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2008-10-30 | — | — | US | disclosed |
| US-7396899-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL CO., LTD. (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20070123674-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2007-05-31 | — | — | US | disclosed |
| US-7160669-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-01-09 | — | — | US | disclosed |
| US-6858370-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-22 | — | — | US | disclosed |
| EP-1167349-B1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-20040224251-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-11 | — | — | US | disclosed |
| US-6808862-B2 | INCLUDING A COMPOUND (ESPECIALLY A SULFONIUM SALT) THAT GENERATES AN ALPHA-FLUOROALKANESULFONIC ACID UPON IRRADIATION; A (NON-FLUORO ALKANESULFONIC ACID ONIUM SALT; AND A MONOCYCLIC OR POLYCYCLIC ALICYCLIC HYDROCARBON RESIN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-6767686-B2 | FOR USE IN LITHOGRAPHY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-07-27 | — | — | US | disclosed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-20030044717-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-03-06 | — | — | US | disclosed |
| US-20030017415-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-01-23 | — | — | US | disclosed |
| US-20020182535-A1 | Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method | NEC CORPORATION (JP) | 2002-12-05 | — | — | US | disclosed |
| US-20020146641-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-10 | — | — | US | disclosed |
| EP-1207423-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-22 | — | — | EP | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| US-20020015913-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-07 | — | — | US | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080269506-A1 | Chemical amplification type resist composition | ASIC1, POLR2B, POLR2A | CA1 76/4885CA2 33/4885MMP1 1760/4885 |
| US-20020182535-A1 | Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method | ASIC1, ASIC3, SULT1A1 | CA1 385/4885CA2 212/4885MMP1 3892/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.