Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | CA1 | P00915 | 2/20 | 0.44 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.44 |
| ▸ | EGFR | P00533 | 1/20 | 0.44 |
| ▸ | FYN | P06241 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 1/20 | 0.44 |
| ▸ | CA6 | P23280 | 1/20 | 0.44 |
| ▸ | CDK2 | P24941 | 1/20 | 0.44 |
| ▸ | MMP12 | P39900 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | ADAMTS5 | Q9UNA0 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL56491 | 0.89 | CA2 (0.58) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL5586637 | 0.84 | CA2 (0.43) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL15068234 | 0.83 | ALDH1A1 (0.42) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL2916950 | 0.83 | CA2 (0.71) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL4055202 | 0.83 | ALDH1A1 (0.45) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL10921220 | 0.83 | CA2 (0.46) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL10849701 | 0.83 | CA2 (0.46) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL77491 | 0.83 | ALDH1A1 (0.60) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL29350632 | 0.83 | ALDH1A1 (0.60) | CA2ALDH1A1TDP1TSHRLMNA | |
| SCHEMBL4399347 | 0.82 | TRPA1 (0.50) | CA2ALDH1A1TDP1TSHRLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104356604-A | Dielectric material composition as well as preparation method and application thereof | UNIV SICHUAN | 2015-02-18 | — | — | CN | claimed |
| CN-101541854-A | Branched polycarbonate resins and processes to prepare the same | SABIC INNOVATIVE PLASTICS IP (NL) | 2009-09-23 | — | — | CN | claimed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230314941-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| CN-1639282-A | Varnish containing polyamide resin and use thereof | NIPPON KAYAKU KK (JP) | 2005-07-13 | — | — | CN | disclosed |
| CN-1639253-A | Sheet and formed product prepared therefrom | DENKI KAGAKU KOGYO KK (JP) | 2005-07-13 | — | — | CN | disclosed |
| EP-1521758-A1 | LATE TRANSITION METAL CATALYSTS FOR OLEFIN POLYMERIZATION AND OLIGOMERIZATION | Exxonmobil Chemical Patents Inc. (US) | 2005-04-13 | — | — | EP | disclosed |
| CN-1531563-A | Composition for protective film, method of using same, and use thereof | �ձ���ҩ��ʽ���� | 2004-09-22 | — | — | CN | disclosed |
| US-20040044147-A1 | Epoxy resin composition, process for producing fiber-reinforced composite materials and fiber-reinforced composite materials | TORAY INDUSTRIES, INC. (JP) | 2004-03-04 | — | — | US | disclosed |
| WO-2004007509-A1 | LATE TRANSITION METAL CATALYSTS FOR OLEFIN POLYMERIZATION AND OLIGOMERIZATION | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2004-01-22 | — | — | WO | disclosed |
| CN-1439038-A | Epoxyresin composition and cured object obtained therefrom | NIPPON KAYAKU KK (JP) | 2003-08-27 | — | — | CN | disclosed |
| EP-1325937-A1 | EPOXY RESIN COMPOSITION, PROCESS FOR PRODUCING FIBER -REINFORCED COMPOSITE MATERIALS AND FIBER-REINFORCED COMPOSITE MATERIALS | TORAY INDUSTRIES, INC. (JP) | 2003-07-09 | — | — | EP | disclosed |
| US-5902516-A | STABILIZER FOR THERMOPLASTIC POLYOLEFIN OR ENGINEERING RESINS | SUMITOMO CHEMICAL CO., LTD (JP) | 1999-05-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | CA2 87/4885ALDH1A1 492/4885TDP1 4539/4885 |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, HCAR1 | CA2 515/4885ALDH1A1 124/4885TDP1 3405/4885 |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HCAR1, H1-0, H1-10 | CA2 772/4885ALDH1A1 104/4885TDP1 3478/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | CA2 26/4885ALDH1A1 1499/4885TDP1 4514/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | CA2 16/4885ALDH1A1 608/4885TDP1 4774/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.