SCHEMBL4493446

SCHEMBL4493446

CCC(C)(C)c1cccc(O)c1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.46
ALDH1A1 P00352 3/20 0.45
TDP1 Q9NUW8 2/20 0.45
TSHR P16473 1/20 0.45
LMNA P02545 2/20 0.44
HPGD P15428 2/20 0.44
ALOX15 P16050 2/20 0.44
HSD17B10 Q99714 2/20 0.44
CA1 P00915 2/20 0.44
ADAMTS4 O75173 1/20 0.44
EGFR P00533 1/20 0.44
FYN P06241 1/20 0.44
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
MMP8 P22894 1/20 0.44
CA6 P23280 1/20 0.44
CDK2 P24941 1/20 0.44
MMP12 P39900 1/20 0.44
RECQL P46063 1/20 0.44
ADAMTS5 Q9UNA0 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL56491 0.89 CA2 (0.58) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL5586637 0.84 CA2 (0.43) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL15068234 0.83 ALDH1A1 (0.42) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL2916950 0.83 CA2 (0.71) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL4055202 0.83 ALDH1A1 (0.45) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL10921220 0.83 CA2 (0.46) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL10849701 0.83 CA2 (0.46) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL77491 0.83 ALDH1A1 (0.60) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL29350632 0.83 ALDH1A1 (0.60) CA2ALDH1A1TDP1TSHRLMNA
SCHEMBL4399347 0.82 TRPA1 (0.50) CA2ALDH1A1TDP1TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104356604-A Dielectric material composition as well as preparation method and application thereof UNIV SICHUAN 2015-02-18 CN claimed
CN-101541854-A Branched polycarbonate resins and processes to prepare the same SABIC INNOVATIVE PLASTICS IP (NL) 2009-09-23 CN claimed
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-11820736-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 US disclosed
US-11820736-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 US disclosed
US-20230314939-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
US-20230314939-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
US-20230314941-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
US-20230314938-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
US-20230314941-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
CN-1639282-A Varnish containing polyamide resin and use thereof NIPPON KAYAKU KK (JP) 2005-07-13 CN disclosed
CN-1639253-A Sheet and formed product prepared therefrom DENKI KAGAKU KOGYO KK (JP) 2005-07-13 CN disclosed
EP-1521758-A1 LATE TRANSITION METAL CATALYSTS FOR OLEFIN POLYMERIZATION AND OLIGOMERIZATION Exxonmobil Chemical Patents Inc. (US) 2005-04-13 EP disclosed
CN-1531563-A Composition for protective film, method of using same, and use thereof �ձ���ҩ��ʽ���� 2004-09-22 CN disclosed
US-20040044147-A1 Epoxy resin composition, process for producing fiber-reinforced composite materials and fiber-reinforced composite materials TORAY INDUSTRIES, INC. (JP) 2004-03-04 US disclosed
WO-2004007509-A1 LATE TRANSITION METAL CATALYSTS FOR OLEFIN POLYMERIZATION AND OLIGOMERIZATION EXXONMOBIL CHEMICAL PATENTS INC. (US) 2004-01-22 WO disclosed
CN-1439038-A Epoxyresin composition and cured object obtained therefrom NIPPON KAYAKU KK (JP) 2003-08-27 CN disclosed
EP-1325937-A1 EPOXY RESIN COMPOSITION, PROCESS FOR PRODUCING FIBER -REINFORCED COMPOSITE MATERIALS AND FIBER-REINFORCED COMPOSITE MATERIALS TORAY INDUSTRIES, INC. (JP) 2003-07-09 EP disclosed
US-5902516-A STABILIZER FOR THERMOPLASTIC POLYOLEFIN OR ENGINEERING RESINS SUMITOMO CHEMICAL CO., LTD (JP) 1999-05-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 CA2 87/4885ALDH1A1 492/4885TDP1 4539/4885
US-20230314939-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-10, H1-0, HCAR1 CA2 515/4885ALDH1A1 124/4885TDP1 3405/4885
US-20230314938-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN HCAR1, H1-0, H1-10 CA2 772/4885ALDH1A1 104/4885TDP1 3478/4885
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, HCN3, RER1 CA2 26/4885ALDH1A1 1499/4885TDP1 4514/4885
US-11820736-B2 Salt, acid generator, resist composition and method for producing resist pattern H1-10, H1-0, H1-2 CA2 16/4885ALDH1A1 608/4885TDP1 4774/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.