SCHEMBL450672

SCHEMBL450672

C/C(=C\C(F)(C(F)(F)F)C(F)(F)F)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.32
AKR1C3 P42330 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL450780 1.00 PTGS1 (0.32) PTGS1AKR1C3
SCHEMBL15754014 0.80 PTGS1 (0.32) PTGS1AKR1C3
SCHEMBL6216639 0.80 PTGS1 (0.32) PTGS1AKR1C3
SCHEMBL225194 0.80 PTGS1 (0.32) PTGS1AKR1C3
SCHEMBL8367170 0.80 PTGS1 (0.32) PTGS1AKR1C3
SCHEMBL209706 0.79 PTGS1 (0.34) PTGS1AKR1C3
SCHEMBL322715 0.79 PTGS1 (0.34) PTGS1AKR1C3
SCHEMBL8473565 0.77 PTGS1 (0.33) PTGS1AKR1C3
SCHEMBL7805599 0.76 PTGS1 (0.30) PTGS1AKR1C3
SCHEMBL1416411 0.76 THRB (0.34) PTGS1AKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-20150198879-A1 Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-07-16 US disclosed
US-8663903-B2 Top coating composition CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-20130216960-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-22 US disclosed
US-20120064459-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-15 US disclosed
US-20120040294-A1 Top Coating Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2012-02-16 US disclosed
EP-1645554-B1 NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM CENTRAL GLASS CO LTD (JP) 2010-12-08 EP disclosed
US-7781602-B2 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same CENTRAL GLASS COMPANY, LIMITED (JP) 2010-08-24 US disclosed
US-7750178-B2 Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom CENTRAL GLASS COMPANY, LIMITED (JP) 2010-07-06 US disclosed
US-20080194764-A1 Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-14 US disclosed
US-7402626-B2 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2008-07-22 US disclosed
EP-1790645-A1 LACTONE COMPOUND, LACTONE-CONTAINING MONOMER, POLYMER OF THOSE, RESIST COMPOSITION USING SAME, METHOD FOR FORMING PATTERN USING SAME Central Glass Company, Limited (JP) 2007-05-30 EP disclosed
US-20070087125-A1 Process for producing top coat film used in lithography CENTRAL GLASS COMPANY, LIMITED. (JP) 2007-04-19 US disclosed
EP-1720067-A1 TOP COAT COMPOSITION Central Glass Company, Limited (JP) 2006-11-08 EP disclosed
US-20060217507-A1 Novel polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom CENTRAL GLASS COMPANY, LIMITED (JP) 2006-09-28 US disclosed
US-20060135744-A1 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same CENTRAL GLASS COMPANY LIMITED (JP) 2006-06-22 US disclosed
EP-1645554-A1 NOVEL POLYMERIZABLE ACRYLATE COMPOUND CONTAINING HEXAFLUOROCARBINOL GROUP AND POLYMER MADE THEREFROM Central Glass Company, Limited (JP) 2006-04-12 EP disclosed
US-20050250898-A1 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2005-11-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060217507-A1 Novel polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom FGFR1, AFF1, PFAS PTGS1 1783/4885AKR1C3 189/4885
US-20060135744-A1 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same PFAS, AFF1, FUBP1 PTGS1 4258/4885AKR1C3 1187/4885
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer ADH1A, ADH1C, ADH5 PTGS1 1561/4885AKR1C3 58/4885
US-20150198879-A1 Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same RER1, SMARCC1, SMCHD1 PTGS1 4699/4885AKR1C3 4193/4885
US-20080194764-A1 Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same PFAS, AFF1, AFF2 PTGS1 4256/4885AKR1C3 926/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.