Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 2/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.59 |
| ▸ | MAPT | P10636 | 8/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.59 |
| ▸ | HPGD | P15428 | 7/20 | 0.59 |
| ▸ | MEN1 | O00255 | 4/20 | 0.55 |
| ▸ | PARL | Q9H300 | 2/20 | 0.55 |
| ▸ | F2 | P00734 | 4/20 | 0.54 |
| ▸ | HTT | P42858 | 3/20 | 0.49 |
| ▸ | XBP1 | P17861 | 2/20 | 0.49 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.48 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2902348 | 0.89 | KDM4E (0.69) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL450310 | 0.86 | KMT2A (0.69) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL14620093 | 0.84 | VDR (0.58) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL29370293 | 0.84 | VDR (1.00) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL64277 | 0.84 | VDR (1.00) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL2903856 | 0.81 | KDM4E (0.51) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL27489087 | 0.81 | KDM4E (0.53) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL12039818 | 0.80 | VDR (0.47) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL5566879 | 0.78 | VDR (0.85) | VDRKDM4EALDH1A1MAPTKMT2A | |
| SCHEMBL27718683 | 0.78 | VDR (0.75) | VDRKDM4EALDH1A1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 654 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100119835-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN INTERNATIONAL LLC (US) | 2010-05-13 | — | — | US | claimed |
| EP-2118197-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2009-11-18 | — | — | EP | claimed |
| WO-2008110512-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2008-09-18 | — | — | WO | claimed |
| US-20040253547-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-12449731-B2 | Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product | ISR CORPORATION (JP) | 2025-10-21 | — | — | US | disclosed |
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| WO-2025075091-A1 | ADHESIVE COMPOSITION, ADHESIVE SHEET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT DEVICE | 日東電工株式会社 | 2025-04-10 | — | — | WO | disclosed |
| WO-2025075090-A1 | ADHESIVE COMPOSITION, ADHESIVE SHEET, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT DEVICE | 日東電工株式会社 | 2025-04-10 | — | — | WO | disclosed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| US-5449705-A | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5449588-A | Shrinkage inhibition | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5442024-A | Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion | CHISSO CORPORATION (JP) | 1995-08-15 | — | — | US | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | EEF1D, RHOA, YWHAH | VDR 4609/4885KDM4E 161/4885ALDH1A1 4238/4885 |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | SMCHD1, PIM1, PIM2 | VDR 4609/4885KDM4E 602/4885ALDH1A1 4758/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.