Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.46 |
| ▸ | SLC22A12 | Q96S37 | 11/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.40 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.40 |
| ▸ | SLC22A11 | Q9NSA0 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.37 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3204983 | 0.91 | HSD11B1 (0.46) | KMT2AMEN1HSD11B1SLC22A12ALDH1A1 | |
| SCHEMBL452885 | 0.90 | HSD11B1 (0.51) | KMT2AMEN1HSD11B1SLC22A12ALDH1A1 | |
| SCHEMBL3183368 | 0.89 | GAA (0.52) | KMT2AHSD11B1SLC22A12 | |
| SCHEMBL3202409 | 0.88 | HSD11B1 (0.43) | KMT2AMEN1HSD11B1SLC22A12ALDH1A1 | |
| SCHEMBL3192056 | 0.88 | HSD11B1 (0.43) | KMT2AMEN1HSD11B1SLC22A12ALDH1A1 | |
| SCHEMBL15675641 | 0.88 | HSD11B1 (0.48) | KMT2AMEN1HSD11B1SLC22A12ALDH1A1 | |
| SCHEMBL450234 | 0.85 | KMT2A (0.54) | KMT2AMEN1HSD11B1SLC22A12 | |
| SCHEMBL547991 | 0.84 | MEN1 (0.48) | KMT2AMEN1HSD11B1SLC22A12ALDH1A1 | |
| SCHEMBL3776619 | 0.80 | RAB9A (0.36) | KMT2AMEN1HSD11B1SLC22A12CYP2C9 | |
| SCHEMBL3181666 | 0.79 | PSEN1 (0.48) | KMT2AHSD11B1CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| US-11970557-B2 | Polymer containing photoacid generator | LG CHEM, LTD. (KR) | 2024-04-30 | — | — | US | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| CN-111699206-B | Polymers comprising photoacid generators | 株式会社LG化学 | 2022-05-10 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| US-20010033994-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |