SCHEMBL15675641

SCHEMBL15675641

O=S(=O)(OS(c1ccc(O)cc1)(c1ccc(O)cc1)c1ccc(O)cc1)c1ccccc1C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 4/20 0.48
ESR1 P03372 1/20 0.43
KMT2A Q03164 3/20 0.42
MEN1 O00255 2/20 0.42
SLC22A12 Q96S37 5/20 0.40
CYP2C9 P11712 1/20 0.40
SLC22A6 Q4U2R8 1/20 0.40
SLC22A8 Q8TCC7 1/20 0.40
SLC22A11 Q9NSA0 1/20 0.40
ESR2 Q92731 2/20 0.39
KAT6A Q92794 1/20 0.39
ALDH1A1 P00352 1/20 0.38
FFAR4 Q5NUL3 1/20 0.37
NAMPT P43490 1/20 0.37
P4HB P07237 1/20 0.37
MAOB P27338 1/20 0.37
ABCG2 Q9UNQ0 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL451960 0.88 KMT2A (0.46) HSD11B1KMT2AMEN1SLC22A12CYP2C9
SCHEMBL450234 0.83 KMT2A (0.54) HSD11B1KMT2AMEN1SLC22A12FFAR4
SCHEMBL3204983 0.83 HSD11B1 (0.46) HSD11B1KMT2AMEN1SLC22A12CYP2C9
SCHEMBL452885 0.82 HSD11B1 (0.51) HSD11B1KMT2AMEN1SLC22A12CYP2C9
SCHEMBL3183368 0.81 GAA (0.52) HSD11B1KMT2ASLC22A12FFAR4MAOB
SCHEMBL3192056 0.80 HSD11B1 (0.43) HSD11B1KMT2AMEN1SLC22A12CYP2C9
SCHEMBL3202409 0.80 HSD11B1 (0.43) HSD11B1KMT2AMEN1SLC22A12CYP2C9
SCHEMBL3132851 0.77 HSD11B1 (0.43) HSD11B1KMT2AMEN1ESR2ALDH1A1
SCHEMBL3181645 0.76 ALDH1A1 (0.40) HSD11B1CYP2C9KAT6AALDH1A1
SCHEMBL3181666 0.74 PSEN1 (0.48) HSD11B1KMT2ACYP2C9MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
US-20200272050-A1 Enhanced EUV Photoresist Materials, Formulations and Processes IRRESISTIBLE MATERIALS, LTD (GB) 2020-08-27 US disclosed
US-10095112-B2 Multiple trigger photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2018-10-09 US disclosed
US-20180246408-A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS IRRESISTIBLE MATERIALS, LTD (GB) 2018-08-30 US disclosed
US-9519215-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS, LTD (GB) 2016-12-13 US disclosed
US-20160246173-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-08-25 US disclosed
US-9383646-B2 Two-step photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2016-07-05 US disclosed
US-9323149-B2 Methanofullerenes IRRESISTIBLE MATERIALS LTD (GB) 2016-04-26 US disclosed
US-9256126-B2 Methanofullerenes IRRESISTIBLE MATERIALS LTD (GB) 2016-02-09 US disclosed
US-9229322-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-01-05 US disclosed
EP-2920142-A1 METHANOFULLERENES Robinson, Alex Philip, Graham (GB) 2015-09-23 EP disclosed
US-9122156-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-09-01 US disclosed
US-20150241773-A1 Two-Step Photoresist Compositions and Methods IRRESISTIBLE MATERIALS LTD (GB) 2015-08-27 US disclosed
US-20150140491-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US disclosed
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US disclosed
US-20140255849-A1 Methanofullerenes IRRESISTIBLE MATERIALS LTD (GB) 2014-09-11 US disclosed
WO-2014078097-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-05-22 WO disclosed
US-20140134843-A1 Methanofullerenes IRRESISTIBLE MATERIALS LTD (GB) 2014-05-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10095112-B2 Multiple trigger photoresist compositions and methods ERCC4, ERCC2, APEX1 HSD11B1 3846/4885ESR1 293/4885KMT2A 2012/4885
US-20140134843-A1 Methanofullerenes WASF2, ERCC4, TUFM HSD11B1 1461/4885ESR1 1036/4885KMT2A 3393/4885
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom HNRNPM, TUFM, MSR1 HSD11B1 4052/4885ESR1 323/4885KMT2A 3270/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.