Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.47 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.42 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.42 |
| ▸ | EDNRA | P25101 | 1/20 | 0.42 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | HTR2C | P28335 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | CTSG | P08311 | 1/20 | 0.41 |
| ▸ | CMA1 | P23946 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27371225 | 0.85 | CA1 (0.41) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL29468592 | 0.83 | ALDH1A1 (0.55) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL475089 | 0.83 | ALDH1A1 (0.55) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL12307 | 0.81 | L3MBTL1 (0.50) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL28278788 | 0.81 | L3MBTL1 (0.50) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL79052 | 0.81 | TSHR (0.45) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL7896751 | 0.79 | KMT2A (0.47) | TSHRACHEALDH1A1TDP1EDNRA | |
| SCHEMBL305238 | 0.79 | TSHR (0.43) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL15023628 | 0.79 | TSHR (0.43) | TSHRACHERAPGEF4ALDH1A1KDM4E | |
| SCHEMBL7369 | 0.79 | CA2 (0.56) | CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7504193-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-7435527-B2 | Mixture of acid generator and resin insoluble in alkaline developer and another acid decomposable compound | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7157208-B2 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-20060046195-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20050277060-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050186506-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| EP-1566694-A1 | Positive resist composition and pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2005-08-24 | — | — | EP | disclosed |
| US-20040253538-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-12-16 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| US-6143917-A | FROM A DIARYL CARBONATE AND AN AMINE COMPOUND HAVING AT LEAST ONE HYDROGEN ATOM LOCATED AT AN N-POSITION UNDER MODERATE CONDITIONS AT A HIGH REACTION RATE WITH A HIGH SELECTIVITY AND WITH A HIGH YIELD | UBE INDUSTRIES, LTD. (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0902014-A1 | PROCESS FOR PRODUCING ARYL CARBAMATES | UBE INDUSTRIES LIMITED (JP) | 1999-03-17 | — | — | EP | disclosed |