Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.44 |
| ▸ | NAMPT | P43490 | 2/20 | 0.44 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.44 |
| ▸ | MMP8 | P22894 | 5/20 | 0.43 |
| ▸ | MMP13 | P45452 | 5/20 | 0.43 |
| ▸ | MMP1 | P03956 | 4/20 | 0.43 |
| ▸ | MMP2 | P08253 | 4/20 | 0.43 |
| ▸ | MMP9 | P14780 | 4/20 | 0.43 |
| ▸ | MMP12 | P39900 | 4/20 | 0.43 |
| ▸ | MMP14 | P50281 | 4/20 | 0.43 |
| ▸ | MMP16 | P51512 | 4/20 | 0.43 |
| ▸ | MMP3 | P08254 | 4/20 | 0.43 |
| ▸ | HTR6 | P50406 | 6/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9242466 | 0.85 | HTR6 (0.55) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL15418953 | 0.84 | PTGS2 (0.55) | PTGS2MMP8MMP13MMP1MMP2 | |
| SCHEMBL8844836 | 0.81 | HTR6 (0.55) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL28175716 | 0.81 | LMNA (0.55) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL3297607 | 0.81 | HSD11B1 (0.63) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL20379701 | 0.81 | HTR6 (0.56) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL5161585 | 0.81 | PTGS2 (0.54) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL28049491 | 0.81 | PTGS2 (0.46) | HSD11B1PTGS2NAMPTAKR1B1MMP8 | |
| SCHEMBL31463127 | 0.79 | AKR1B1 (0.56) | HSD11B1PTGS2NAMPTAKR1B1HTR6 | |
| Ethylenediamine SCHEMBL28210540 | 0.77 | HTR6 (0.52) | HSD11B1PTGS2NAMPTAKR1B1MMP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110885401-B | Copolymer, curable resin composition containing same, and cured product thereof | 株式会社大赛璐 | 2023-06-13 | — | — | CN | disclosed |
| CN-111484820-B | Photocurable adhesive composition and photocurable adhesive tape | 3M创新有限公司 | 2022-03-29 | — | — | CN | disclosed |
| CN-113166373-A | Epoxy resin photosensitive composition for optical waveguide, photosensitive film for optical waveguide, and opto-electric hybrid board | 日东电工株式会社 | 2021-07-23 | — | — | CN | disclosed |
| CN-106536654-B | Adhesive, adhesive body, and method for producing adhesive body | 株式会社可乐丽 | 2021-01-08 | — | — | CN | disclosed |
| CN-105375232-B | Method for manufacturing connection structure and anisotropic conductive adhesive film | 迪睿合株式会社 | 2020-09-22 | — | — | CN | disclosed |
| CN-111484820-A | Photocurable adhesive composition and photocurable adhesive tape | 3M创新有限公司 | 2020-08-04 | — | — | CN | disclosed |
| CN-110885401-A | Copolymer, curable resin composition containing same, and cured product thereof | 株式会社大赛璐 | 2020-03-17 | — | — | CN | disclosed |
| US-7534820-B2 | Photocuring resin composition containing organic polymer having epoxy group and/or oxetane group-containing silicon group at end, and method for producing same | KANEKA CORPORATION (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20070066699-A1 | Photocuring composition containing organic polymer having epoxy group and/or oxethane group-containing silicon group at end, and method for producing same | KANEKA CORPORATION | 2007-03-22 | — | — | US | disclosed |
| EP-1679328-A1 | PHOTOCURING RESIN COMPOSITION CONTAINING ORGANIC POLYMER HAVING EPOXY GROUP AND/OR OXETHANE GROUP-CONTAINING SILICON GROUP AT END, AND METHOD FOR PRODUCING SAME | KANEKA CORPORATION (JP) | 2006-07-12 | — | — | EP | disclosed |
| EP-0869393-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 2000-05-31 | — | — | EP | disclosed |
| US-6037098-A | AROMATIC SULFONIC ACID GENERATED FROM A SULFONIUM COMPOUND TO ENHANCE RESIN ALKALINE SOLUBILITY; REDUCED DIFFUSIBILITY OF ACID IN FILM, I.E., UNIFORM LINE WIDTH; HIGH PHOTOSENSITIVITY AND PHOTODECOMPOSITION EFFICIENCY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| EP-0869393-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-10-07 | — | — | EP | disclosed |