Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284284 | 0.85 | NAAA (0.32) | — | |
| Ethane SCHEMBL28205575 | 0.84 | NAAA (0.31) | — | |
| SCHEMBL28790459 | 0.83 | — | — | |
| SCHEMBL4333995 | 0.82 | — | — | |
| SCHEMBL30185994 | 0.81 | — | — | |
| SCHEMBL29618128 | 0.78 | TSHR (0.31) | ALDH1A1 | |
| SCHEMBL3858081 | 0.78 | DPP4 (0.30) | — | |
| SCHEMBL134073 | 0.78 | ALDH1A1 (0.31) | THRBALDH1A1LMNAHTTSMN1; SMN2 | |
| Acrylic Acid SCHEMBL27911850 | 0.78 | THRB (0.31) | THRBCYP2C9 | |
| SCHEMBL31309841 | 0.77 | THRB (0.30) | THRBALDH1A1LMNAHTTSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 186 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114380937-A | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| EP-1551887-A4 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2008-07-02 | — | — | EP | claimed |
| US-20050203262-A1 | Fluorinated polymers, photoresists and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-09-15 | — | — | US | claimed |
| EP-1551887-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E. I. du Pont de Nemours and Company (US) | 2005-07-13 | — | — | EP | claimed |
| WO-2004011509-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-05 | — | — | WO | claimed |
| US-12264073-B2 | Composite material | ADEKA CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| WO-2023190605-A1 | COMPOSITE MATERIAL AND METHOD FOR PRODUCING SAME, AND CROSSLINKING AGENT | 国立大学法人大阪大学 | 2023-10-05 | — | — | WO | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| WO-2023171709-A1 | RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | 国立大学法人大阪大学 | 2023-09-14 | — | — | WO | disclosed |
| CN-112585113-B | Process for distillative purification of fluorine-containing polymerizable monomers | 中央硝子株式会社 | 2023-08-22 | — | — | CN | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-20030113661-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-19 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-20020052449-A1 | Method of quantifying protective ratio of hydroxyl groups of polymer compound | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-05-02 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-0936504-A1 | A radiation-sensitive material and a method for forming a pattern therewith | Daicel Chemical Industries, Ltd. (JP) | 1999-08-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | THRB 2068/4885ALDH1A1 865/4885LMNA 2606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.