Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | CA4 | P22748 | 2/20 | 0.43 |
| ▸ | CA6 | P23280 | 2/20 | 0.43 |
| ▸ | CA5A | P35218 | 2/20 | 0.43 |
| ▸ | CA7 | P43166 | 2/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.43 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA3 | P07451 | 1/20 | 0.43 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6259956 | 0.81 | HTR6 (0.50) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL21694065 | 0.79 | HTR6 (0.47) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL16327116 | 0.78 | ALDH1A1 (0.47) | ALDH1A1TDP1CA1CA2TSHR | |
| SCHEMBL20540912 | 0.73 | HTR6 (0.43) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL296383 | 0.73 | HTR6 (0.58) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL915049 | 0.71 | HTR6 (0.47) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL7935363 | 0.71 | HTR6 (0.47) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL19537583 | 0.69 | HTR6 (0.53) | HTR6ALDH1A1TDP1CA1CA2 | |
| SCHEMBL3259521 | 0.69 | HTR6 (0.53) | HTR6ALDH1A1TDP1CA1CA2 | |
| Fluoride SCHEMBL943498 | 0.69 | HTR6 (0.45) | HTR6ALDH1A1TDP1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111662267-B | Photoresist acid-producing resin monomer containing dioxobicyclo [2.2.2] octane dicarboxylic acid ester structure and preparation method thereof | 徐州博康信息化学品有限公司 | 2021-09-17 | — | — | CN | claimed |
| CN-113173873-A | Preparation method of triphenylsulfur perfluorobutane sulfonate sulfonium salt | 河北凯诺中星科技有限公司 | 2021-07-27 | — | — | CN | claimed |
| CN-111662267-A | Photoresist acid-producing resin monomer containing dioxobicyclo [2.2.2] octane dicarboxylic acid ester structure and preparation method thereof | 徐州博康信息化学品有限公司 | 2020-09-15 | — | — | CN | claimed |
| CN-118302424-A | Dielectric materials based on heteroaromatic extended bismaleimides | 默克专利有限公司 | 2024-07-05 | — | — | CN | disclosed |
| US-11834419-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | LG CHEM, LTD. (KR) | 2023-12-05 | — | — | US | disclosed |
| US-11834419-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | LG CHEM, LTD. (KR) | 2023-12-05 | — | — | US | disclosed |
| US-11680040-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | LG CHEM, LTD. (KR) | 2023-06-20 | — | — | US | disclosed |
| US-11680040-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | LG CHEM, LTD. (KR) | 2023-06-20 | — | — | US | disclosed |
| CN-111662267-B | Photoresist acid-producing resin monomer containing dioxobicyclo [2.2.2] octane dicarboxylic acid ester structure and preparation method thereof | 徐州博康信息化学品有限公司 | 2021-09-17 | — | — | CN | disclosed |
| CN-113173873-A | Preparation method of triphenylsulfur perfluorobutane sulfonate sulfonium salt | 河北凯诺中星科技有限公司 | 2021-07-27 | — | — | CN | disclosed |
| CN-113173873-A | Preparation method of triphenylsulfur perfluorobutane sulfonate sulfonium salt | 河北凯诺中星科技有限公司 | 2021-07-27 | — | — | CN | disclosed |
| US-7368544-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7314698-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-7090957-B2 | Polymerizable composition and planographic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-15 | — | — | US | disclosed |
| US-20060135742-A1 | Polymerizable composition and planographic printng plate precursor using the same | FUJI PHOTO FILM CO., LTD. | 2006-06-22 | — | — | US | disclosed |
| US-20060127809-A1 | Polymerizable composition and planographic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. | 2006-06-15 | — | — | US | disclosed |
| CN-1675251-A | Aid and method for processing thermoplastic polymer compositions | BAERLOCHER GMBH (DE) | 2005-09-28 | — | — | CN | disclosed |
| CN-1495524-A | Polymeric composition and lithographic printing platemaking forebody | 富士胶片株式会社 | 2004-05-12 | — | — | CN | disclosed |
| US-20040062939-A1 | Polymerizable composition and planogaphic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. | 2004-04-01 | — | — | US | disclosed |
| EP-1400851-A2 | Polymerizable composition and planographic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11680040-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | SETD7, PCBP1, PPOX | HTR6 2567/4885ALDH1A1 2450/4885TDP1 3575/4885 |
| US-11834419-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | PPOX, SETD7, CRY1 | HTR6 3499/4885ALDH1A1 997/4885TDP1 3630/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.