SCHEMBL4632090

SCHEMBL4632090

O=S(Cl)(Cl)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.35
ALDH1A1 P00352 5/20 0.33
BBOX1 O75936 2/20 0.33
EHMT2 Q96KQ7 2/20 0.33
EHMT1 Q9H9B1 2/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
DAO P14920 1/20 0.30
NAPRT Q6XQN6 1/20 0.30
ALOX15 P16050 1/20 0.30
CES2 O00748 1/20 0.30
CES1 P23141 1/20 0.30
HTR6 P50406 1/20 0.30
CYP2A6 P11509 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18261833 0.69 CA2 (0.35) TSHRTDP1
SCHEMBL2209912 0.69 TSHR (0.35) TSHRALDH1A1BBOX1EHMT2EHMT1
SCHEMBL3684648 0.69 TSHR (0.35) TSHRALDH1A1BBOX1EHMT2EHMT1
Benzene SCHEMBL28958130 0.69 TSHR (0.39) TSHRALDH1A1BBOX1EHMT2EHMT1
SCHEMBL278265 0.69 TSHR (0.39) TSHRALDH1A1BBOX1EHMT2EHMT1
SCHEMBL10639940 0.69 NPSR1 (0.38) TSHRALDH1A1BBOX1EHMT2EHMT1
SCHEMBL6003247 0.69 BBOX1 (0.33) TSHRALDH1A1BBOX1EHMT2EHMT1
SCHEMBL17963728 0.69 TSHR (0.35) TSHRALDH1A1BBOX1EHMT2EHMT1
SCHEMBL17400778 0.65 LMNA (0.32) TSHRBBOX1EHMT2EHMT1LMNA
SCHEMBL22082912 0.65 TSHR (0.32) TSHRBBOX1EHMT2EHMT1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116332883-A Method for preparing 5-hydroxymethylfurfural from amino sugar 中国科学院海洋研究所 2023-06-27 CN claimed
EP-3914584-A1 (C)CRYSTAL COMPOSITION (CC) COMPRISING 4,4'-DICHLORODIPHENYLSULFONE CRYSTALS (C) BASF SE (DE) 2021-12-01 EP claimed
CN-113396141-A Method for purifying 4, 4' -dichlorodiphenyl sulfoxide 巴斯夫欧洲公司 2021-09-14 CN claimed
WO-2021037797-A1 (C)CRYSTAL COMPOSITION (CC) COMPRISING 4,4'-DICHLORODIPHENYLSULFONE CRYSTALS (C) BASF SE (DE) 2021-03-04 WO claimed
WO-2016038218-A1 A PROCESS FOR PREVENTING THIOPHENOL FORMATION AND/OR ACCUMULATION DURING PRODUCTION OF POLY(ARYLENE SULFIDE) SOLVAY SA (BE) 2016-03-17 WO claimed
US-20160075832-A1 Process for Preventing Thiophenol Formation and/or Accumulation During Production of Poly(Arylene Sulfide) SOLVAY SA (BE) 2016-03-17 US claimed
EP-0272903-B1 PROCESS FOR PRODUCING A POLYARYLENE SULFIDE Tosoh Corporation (JP) 1993-07-21 EP claimed
EP-0275687-B1 PROCESS FOR PREPARING POLYARYLENE SULFIDES Tosoh Corporation (JP) 1992-04-22 EP claimed
CN-115559061-B High-performance PE fiber composite weft-free cloth and production process thereof 重庆美力斯新材料科技股份有限公司 2024-06-21 CN disclosed
CN-118024701-B Preparation method of sheet, scratch-resistant hot-bending sheet and application of sheet in clothing 汕头市亮彩新材料科技有限公司 2024-06-07 CN disclosed
CN-118024701-A Preparation method of sheet, scratch-resistant hot-bending sheet and application of sheet in clothing 汕头市亮彩新材料科技有限公司 2024-05-14 CN disclosed
CN-117946154-A Organic silicon resin monomer containing large steric hindrance functional group, preparation method thereof and application of high-temperature-resistant material 哈尔滨工业大学 2024-04-30 CN disclosed
CN-117486765-A Method for preparing 4,4' -dichlorodiphenyl sulfone 山东师范大学实验厂有限公司 2024-02-02 CN disclosed
CN-116622218-B Ageing-resistant polyurethane material, preparation method and application thereof on sealing ring 苏州美福瑞新材料科技有限公司 2023-12-12 CN disclosed
CN-1437641-A Composite profile parts comprising polyarylene sulfide and silicone rubber GE BAYER SILICONES GMBH & CO (DE) 2003-08-20 CN disclosed
CN-1244887-A Polyarylene sulfide resin composition KUREHA CHEMICAL IND CO LTD (JP) 2000-02-16 CN disclosed
CN-1244886-A Polyarylene sulfide resin composition KUREHA CHEMICAL IND CO LTD (JP) 2000-02-16 CN disclosed
CN-1195356-A Photopolymerization initiator and energy ray-curable composition containing the same NIPPON KAYAKU KK (JP) 1998-10-07 CN disclosed
EP-0327501-A2 Linear polyether resin CIBA-GEIGY AG (CH) 1989-08-09 EP disclosed
EP-0282266-A2 Process for producing carboxylic acid amides or esters NIHON NOHYAKU CO., LTD. (JP) 1988-09-14 EP disclosed