Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL7721919 | 0.87 | — | — | |
| Water SCHEMBL16781663 | 0.87 | — | — | |
| Water SCHEMBL28130028 | 0.87 | — | — | |
| Water SCHEMBL9571768 | 0.87 | — | — | |
| Water SCHEMBL887108 | 0.87 | — | — | |
| Water SCHEMBL27739932 | 0.87 | — | — | |
| Water SCHEMBL5783055 | 0.87 | — | — | |
| Water SCHEMBL22981772 | 0.82 | — | — | |
| SCHEMBL8202350 | 0.82 | — | — | |
| Water SCHEMBL500958 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110354880-B | Strontium bismuth oxygen-strontium carbonate composite photocatalyst, preparation method thereof and application of composite photocatalyst in catalytic reduction of hexavalent chromium | 桂林电子科技大学 | 2022-06-07 | — | — | CN | claimed |
| US-6194227-B1 | Method of producing a bismuth layer structured ferroelectric thin film | SYMETRIX CORPORATION | 2001-02-27 | — | — | US | claimed |
| CN-120129236-A | Semiconductor device with a semiconductor layer having a plurality of semiconductor layers | 三星电子株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-119930019-A | Piezoelectric photocatalysis reactor based on self-driven aeration stirring | 兰州交通大学 | 2025-05-06 | — | — | CN | disclosed |
| CN-115745135-B | Self-cleaning photoelectric integrated sewage treatment device and sewage treatment method | 四川大学 | 2024-03-08 | — | — | CN | disclosed |
| CN-115745135-A | Self-cleaning photoelectric integrated sewage treatment device and sewage treatment method | 四川大学 | 2023-03-07 | — | — | CN | disclosed |
| CN-110354880-B | Strontium bismuth oxygen-strontium carbonate composite photocatalyst, preparation method thereof and application of composite photocatalyst in catalytic reduction of hexavalent chromium | 桂林电子科技大学 | 2022-06-07 | — | — | CN | disclosed |
| CN-110354880-B | Strontium bismuth oxygen-strontium carbonate composite photocatalyst, preparation method thereof and application of composite photocatalyst in catalytic reduction of hexavalent chromium | 桂林电子科技大学 | 2022-06-07 | — | — | CN | disclosed |
| CN-110354880-B | Strontium bismuth oxygen-strontium carbonate composite photocatalyst, preparation method thereof and application of composite photocatalyst in catalytic reduction of hexavalent chromium | 桂林电子科技大学 | 2022-06-07 | — | — | CN | disclosed |
| CN-110354880-A | A kind of application of strontium bismuth oxygen-strontium carbonate composite photo-catalyst and preparation method thereof and catalysis reduction of hexavalent chromium | 桂林电子科技大学 | 2019-10-22 | — | — | CN | disclosed |
| CN-110354880-A | A kind of application of strontium bismuth oxygen-strontium carbonate composite photo-catalyst and preparation method thereof and catalysis reduction of hexavalent chromium | 桂林电子科技大学 | 2019-10-22 | — | — | CN | disclosed |
| CN-106531451-B | A kind of Sr-Bi-C nano material, preparation method and its application | 华北电力大学（保定） | 2019-01-22 | — | — | CN | disclosed |
| CN-106531451-A | Sr-Bi-C nanomaterial, preparation method and application thereof | 华北电力大学（保定） | 2017-03-22 | — | — | CN | disclosed |
| EP-1190988-B1 | Bismuth-containing laser markable compositions and methods of making and using same | FERRO GMBH (DE) | 2008-09-10 | — | — | EP | disclosed |
| US-20060125746-A1 | Microelectrical device | ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) (CH) | 2006-06-15 | — | — | US | disclosed |
| US-6680121-B2 | MIXED OXIDE INORGANIC PIGMENTS DISPERSED IN A SUBSTRATE WHICH IS IRRADIATED BY A LASER TO PROVIDE A CONTRASTING MARK | DMC2 DEGUSSA METALS CATALYSTS CERDEC AG (DE) | 2004-01-20 | — | — | US | disclosed |
| US-20030108723-A1 | Bismuth-containing laser markable compositions and methods of making and using same | FERRO GMBH (DE) | 2003-06-12 | — | — | US | disclosed |
| US-6503316-B1 | Additive, pigment or colorant materials which may be used for laser marking. The materials comprise oxides of bismuth and at least one additional metal. Preferred laser-markable bismuth-containing oxide compounds are BIxMyOz and radiation | DMC2 DEGUSSA METALS CATALYSTS CERDEC AG (DE) | 2003-01-07 | — | — | US | disclosed |
| EP-1190988-A2 | Bismuth-containing laser markable compositions and methods of making and using same | dmc2 Degussa Metals Catalysts Cerdec AG (DE) | 2002-03-27 | — | — | EP | disclosed |
| US-5885648-A | PREPARING A BATCH OF LIQUID PRECURSOR OF SAID MIXED METAL OXIDE, FORMING A FIRST THIN FILM, ANALYZING, MODIFYING, FORMING SECOND THIN FILM | RAYTHEON COMPANY (US) | 1999-03-23 | — | — | US | disclosed |