SCHEMBL4673337

SCHEMBL4673337

CCOC(=O)COC(=O)CC

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.55
MGAM O43451 1/20 0.55
SI P14410 1/20 0.55
MGAM2 Q2M2H8 1/20 0.55
ALDH1A1 P00352 3/20 0.50
TRPA1 O75762 1/20 0.50
SOAT1 P35610 1/20 0.48
LMNA P02545 1/20 0.43
HSD17B10 Q99714 1/20 0.43
NLRP3 Q96P20 7/20 0.43
NAAA Q02083 1/20 0.43
CYP1A2 P05177 1/20 0.43
TSHR P16473 1/20 0.42
ALOX15 P16050 1/20 0.42
NPSR1 Q6W5P4 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethyl Propionate SCHEMBL28766962 0.89
Ethyl Propionate SCHEMBL16045 0.89
Ethyl Propionate SCHEMBL4883389 0.89
Ethyl Propionate SCHEMBL1868177 0.89 GAA (0.67) GAAMGAMSIMGAM2ALDH1A1
Ethyl Propionate SCHEMBL1332690 0.89
Ethyl Propionate SCHEMBL25298294 0.86
Ethyl Propionate SCHEMBL7036034 0.86
Ethyl Propionate SCHEMBL10576295 0.86
Ethyl Propionate SCHEMBL19376923 0.86 GAA (0.63) GAAMGAMSIMGAM2ALDH1A1
Ethyl Propionate SCHEMBL25183273 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 US disclosed
US-20230314941-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-02 US disclosed
CN-109553705-B Catalyst component for olefin polymerization and preparation method thereof 中国石油化工股份有限公司 2021-04-13 CN disclosed
CN-109553712-B Catalyst component for olefin polymerization and catalyst thereof 中国石油化工股份有限公司 2021-03-16 CN disclosed
US-9097969-B2 Compound, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-08-04 US disclosed
US-7491781-B2 Propylene polymer catalyst donor component INEOS USA LLC (US) 2009-02-17 US disclosed
US-20080194782-A1 Propylene polymer catalyst donor component INEOS USA LLC 2008-08-14 US disclosed
US-20070179047-A1 Propylene polymer catalyst donor component INNOVENE USA (US) 2007-08-02 US disclosed
US-20070179047-A1 Propylene polymer catalyst donor component INNOVENE USA (US) 2007-08-02 US disclosed
EP-1101761-B1 Process for producing 3-phenyluracil compounds SUMITOMO CHEMICAL CO (JP) 2005-08-17 EP disclosed
US-20030216258-A1 Condensed heterocylic compounds and herbicides containing them as active ingredients SUMITOMO CHEMICAL COMPANY, LIMITED 2003-11-20 US disclosed
US-6586368-B1 Benzofuran derivatives SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-07-01 US disclosed
US-6410484-B1 ACTIVE MATERIAL; CONTROLLING WEEDS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-06-25 US disclosed
US-6339155-B1 Process for producing 3-phenyluracil compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-15 US disclosed
EP-1101761-A2 Process for producing 3-phenyluracil compounds SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-05-23 EP disclosed
EP-1095935-A1 6-Hydroxy-5,6-dihydrouracils as herbicides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-05-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern HAX1, BRIX1, RXRA GAA 2547/4885MGAM 3975/4885SI 4399/4885
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern RER1, AFF1, AFF4 GAA 4143/4885MGAM 1132/4885SI 4739/4885
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, HCN3, RER1 GAA 4586/4885MGAM 2892/4885SI 4720/4885
US-20030216258-A1 Condensed heterocylic compounds and herbicides containing them as active ingredients CBR3, CBR1, HAAO GAA 3021/4885MGAM 2073/4885SI 3331/4885
US-20080194782-A1 Propylene polymer catalyst donor component RAD52, NR2C2, PGR GAA 4879/4885MGAM 3863/4885SI 4883/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.