Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABCB1 | P08183 | 4/20 | 0.44 |
| ▸ | RECQL | P46063 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 8/20 | 0.41 |
| ▸ | CA2 | P00918 | 8/20 | 0.41 |
| ▸ | CA9 | Q16790 | 7/20 | 0.41 |
| ▸ | CA12 | O43570 | 3/20 | 0.41 |
| ▸ | CA7 | P43166 | 3/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.41 |
| ▸ | CA3 | P07451 | 2/20 | 0.41 |
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | CA6 | P23280 | 2/20 | 0.41 |
| ▸ | CA5A | P35218 | 2/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.41 |
| ▸ | ABCC1 | P33527 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL158975 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL161091 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL157657 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL160139 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL159300 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL160041 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL160144 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL10420606 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL158971 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD | |
| SCHEMBL31189133 | 0.91 | ABCB1 (0.50) | ABCB1RECQLTSHRGLAHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| US-20180120706-A1 | PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| EP-2941781-B1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | CANON KK (JP) | 2017-08-09 | — | — | EP | disclosed |
| US-9447303-B2 | Composition for forming resist underlayer film | JSR CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| EP-1447403-B1 | 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS | MITSUBISHI RAYON CO (JP) | 2016-02-03 | — | — | EP | disclosed |
| US-20150368433-A1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 2015-12-24 | — | — | US | disclosed |
| US-20150197664-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9040232-B2 | Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film | JSR CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20150086755-A1 | PHOTOCURED PRODUCT | CANON KABUSHIKI KAISHA (JP) | 2015-03-26 | — | — | US | disclosed |
| US-20120129353-A1 | METHOD FOR PATTERN FORMATION, METHOD AND COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2012-05-24 | — | — | US | disclosed |
| EP-1352904-B1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | MITSUBISHI RAYON CO (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-7339014-B2 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO., LTD. (JP) | 2008-03-04 | — | — | US | disclosed |
| US-7316884-B2 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-08 | — | — | US | disclosed |
| US-7041838-B2 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI RAYON CO., LTD. (JP) | 2006-05-09 | — | — | US | disclosed |
| US-20050113538-A1 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO.,LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20040248031-A1 | 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1447403-A1 | 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS | Mitsubishi Rayon Co., Ltd. (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1352904-A1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150368433-A1 | PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION | PFN1, PFAS, FRG1 | ABCB1 4356/4885RECQL 3085/4885TSHR 3939/4885 |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | ADH1A, ADH1C, ADH5 | ABCB1 3481/4885RECQL 1608/4885TSHR 2043/4885 |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | ABCB1 4356/4885RECQL 3085/4885TSHR 3939/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.