SCHEMBL472018

SCHEMBL472018

CC1(C(=O)OCC(F)(F)F)CC2C=CC1C2

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
P2RX7 Q99572 1/20 0.34
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
HTT P42858 1/20 0.32
CETP P11597 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5347783 0.87 P2RX7 (0.35) P2RX7CYP2D6CYP2C19CETP
SCHEMBL17147582 0.84 P2RX7 (0.34) P2RX7CYP2D6CYP2C19CETP
SCHEMBL10175353 0.82 USP2 (0.33) P2RX7CYP2C19
SCHEMBL200228 0.82 CYP2C19 (0.40) P2RX7CYP2D6CYP2C19CETP
SCHEMBL203304 0.81 P2RX7 (0.36) P2RX7CYP2D6CYP2C19CETP
SCHEMBL13744776 0.80 HTT (0.32) CYP2D6CYP2C19HTT
SCHEMBL201163 0.79 CYP2D6 (0.38) P2RX7CYP2D6CYP2C19CETP
SCHEMBL14628487 0.79 P2RX7 (0.36) P2RX7CYP2D6CYP2C19CETP
SCHEMBL4253408 0.79 P2RX7 (0.36) P2RX7CYP2D6CYP2C19CETP
SCHEMBL472017 0.79 P2RX7 (0.34) P2RX7CYP2D6CYP2C19CETP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114402258-A Radiation-sensitive resin composition 日本瑞翁株式会社 2022-04-26 CN disclosed
US-11169440-B2 Radiation-sensitive resin composition and electronic component ZEON CORPORATION (JP) 2021-11-09 US disclosed
EP-3345970-B1 RESIN COMPOSITION ZEON CORP (JP) 2021-07-28 EP disclosed
EP-3434731-B1 RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE ZEON CORP (JP) 2021-06-09 EP disclosed
US-10775697-B2 Radiation-sensitive resin composition, resin film, and electronic device ZEON CORPORATION (JP) 2020-09-15 US disclosed
US-10622527-B2 Infrared LED ZEON CORPORATION (JP) 2020-04-14 US disclosed
US-10446690-B2 Method of production of semiconductor device TOHOKU UNIVERSITY (JP) 2019-10-15 US disclosed
EP-3121652-B1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT ZEON CORP (JP) 2019-09-04 EP disclosed
US-20190221729-A1 INFRARED LED ZEON CORPORATION (JP) 2019-07-18 US disclosed
EP-3486957-A1 INFRARED LED Zeon Corporation (JP) 2019-05-22 EP disclosed
US-20040106740-A1 Resin film and applications thereof JSR CORPORATION (JP) 2004-06-03 US disclosed
EP-1416528-A2 Method of forming cavity between multilayered wirings JSR Corporation (JP) 2004-05-06 EP disclosed
US-20040072094-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2004-04-15 US disclosed
EP-1195397-B1 Composition of cyclic olefin addition copolymer and cross-linked material JSR CORP (JP) 2004-04-14 EP disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
CN-1347939-A Cycloolefen addition copolymer composition and cross-linked material JSR CORP (JP) 2002-05-08 CN disclosed
US-20020042461-A1 Composition of cyclic olefin addition copolymer and cross-linked material JSR CORPORATION (JP) 2002-04-11 US disclosed
EP-1195397-A1 Composition of cyclic olefin addition copolymer and cross-linked material JSR Corporation (JP) 2002-04-10 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed