Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D
The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 4/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | DAO | P14920 | 1/20 | 0.40 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 1/20 | 0.36 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.36 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.35 |
| ▸ | AKT1 | P31749 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL472128 | 0.81 | KDM4E (0.50) | KDM4EALDH1A1POLBGAAAKR1C3 | |
| SCHEMBL553473 | 0.79 | — | — | |
| Benzoic Acid SCHEMBL472157 | 0.72 | TSHR (0.48) | KDM4EALDH1A1POLBGAAAKR1C3 | |
| Benzoic Acid SCHEMBL472075 | 0.71 | AKR1C3 (0.47) | KDM4EALDH1A1POLBGAAAKR1C3 | |
| SCHEMBL11334683 | 0.71 | ALDH1A1 (0.49) | KDM4EALDH1A1POLBGAAMEN1 | |
| SCHEMBL7113196 | 0.70 | LMNA (0.35) | KDM4EALDH1A1POLBGAAHTT | |
| SCHEMBL7113197 | 0.70 | ALDH1A1 (0.38) | KDM4EALDH1A1KMT2ASMN1; SMN2SRD5A2 | |
| SCHEMBL11391999 | 0.70 | ESR2 (0.46) | ALDH1A1POLBKMT2AHTTTSHR | |
| SCHEMBL11042016 | 0.70 | MAPT (0.44) | KDM4EALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL11042013 | 0.70 | MAPT (0.44) | KDM4EALDH1A1MEN1KMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8664414-B2 | Process for producing epoxy compound | SHOWA DENKO K.K. (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8466303-B2 | Process for production of epoxy compound | SHOWA DENKO K.K. (JP) | 2013-06-18 | — | — | US | disclosed |
| US-20120029217-A1 | PROCESS FOR PRODUCING EPOXY COMPOUND | SHOWA DENKO K.K. (JP) | 2012-02-02 | — | — | US | disclosed |
| EP-2412712-A1 | METHOD FOR PRODUCING EPOXY COMPOUND | Showa Denko K.K. (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20110009652-A1 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND | SHOWA DENKO KK (JP) | 2011-01-13 | — | — | US | disclosed |
| EP-2261219-A1 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND | Showa Denko K.K. (JP) | 2010-12-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120029217-A1 | PROCESS FOR PRODUCING EPOXY COMPOUND | NOX4, NOX5, NOXO1 | KDM4E 334/4885ALDH1A1 1104/4885POLB 1870/4885 |
| US-20110009652-A1 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND | DUOX2, EPX, DUOX1 | KDM4E 1593/4885ALDH1A1 680/4885POLB 326/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.