SCHEMBL472140

SCHEMBL472140

O=C(OC=CCc1ccccc1)C1CC=CCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MIF P14174 1/20 0.41
RAB9A P51151 2/20 0.37
MEN1 O00255 5/20 0.37
KMT2A Q03164 5/20 0.37
KDM4E B2RXH2 4/20 0.37
ALDH1A1 P00352 3/20 0.37
HTT P42858 2/20 0.37
TDP1 Q9NUW8 1/20 0.37
MAOB P27338 1/20 0.36
HSD17B10 Q99714 3/20 0.35
MAPT P10636 1/20 0.35
ALOX15 P16050 1/20 0.35
ESR2 Q92731 1/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
TOP1 P11387 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3785400 0.92 ALDH1A1 (0.36) MIFMEN1KMT2AKDM4EALDH1A1
SCHEMBL3785863 0.90 MAOB (0.41) MEN1KMT2AALDH1A1MAOBHSD17B10
SCHEMBL472153 0.77 MIF (0.41) MIFRAB9AMEN1KMT2AKDM4E
SCHEMBL472070 0.77 SMN1; SMN2 (0.48) MIFRAB9AKMT2AALDH1A1TDP1
SCHEMBL717144 0.77 SMN1; SMN2 (0.48) MIFRAB9AKMT2AALDH1A1TDP1
SCHEMBL3306289 0.77 SMN1; SMN2 (0.48) MIFRAB9AKMT2AALDH1A1TDP1
SCHEMBL3784914 0.77 MAOB (0.39) RAB9AALDH1A1MAOBHSD17B10MAPT
SCHEMBL3789092 0.75 LMNA (0.36) RAB9AMEN1KMT2AALDH1A1MAOB
SCHEMBL19204881 0.73 TSHR (0.50) RAB9AALDH1A1MAOBCA1CA2
SCHEMBL14775423 0.71 MAOB (0.54) KMT2AALDH1A1TDP1MAOBCA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed
US-7696366-B2 Production process of bifunctional epoxy monomer by selective oxidation of diolefin compound SHOWA DENKO K.K. (JP) 2010-04-13 US disclosed
EP-1891031-B1 PRODUCTION PROCESS OF BIFUNCTIONAL EPOXY MONOMER BY SELECTIVE OXIDATION OF DIOLEFIN COMPOUND SHOWA DENKO KK (JP) 2009-03-11 EP disclosed
US-20090030217-A1 PRODUCTION PROCESS OF BIFUNCTIONAL EPOXY MONOMER BY SELECTIVE OXIDATION OF DIOLEFIN COMPOUND SHOWA DENKO K.K. (JP) 2009-01-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 MIF 4003/4885RAB9A 3770/4885MEN1 3910/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 MIF 3949/4885RAB9A 4376/4885MEN1 4361/4885
US-20090030217-A1 PRODUCTION PROCESS OF BIFUNCTIONAL EPOXY MONOMER BY SELECTIVE OXIDATION OF DIOLEFIN COMPOUND DUOX2, DUOX1, DDT MIF 1324/4885RAB9A 4289/4885MEN1 637/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.