Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.57 |
| ▸ | CA12 | O43570 | 3/20 | 0.55 |
| ▸ | CA1 | P00915 | 3/20 | 0.55 |
| ▸ | CA2 | P00918 | 3/20 | 0.55 |
| ▸ | CA7 | P43166 | 3/20 | 0.55 |
| ▸ | CA9 | Q16790 | 3/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.55 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.55 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | MYC | P01106 | 1/20 | 0.47 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 8/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 5/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8646661 | 0.80 | HCAR3 (0.57) | ALDH1A1CA12CA1CA2CA7 | |
| SCHEMBL19689021 | 0.80 | ALDH1A1 (0.57) | ALDH1A1CA12CA1CA2CA7 | |
| SCHEMBL22445648 | 0.79 | EGFR (0.42) | ALDH1A1CA12CA1CA2CA7 | |
| SCHEMBL5311696 | 0.79 | CA1 (0.62) | ALDH1A1CA12CA1CA2CA7 | |
| SCHEMBL11165063 | 0.79 | SMN1; SMN2 (0.56) | ALDH1A1CA12CA1CA2CA7 | |
| SCHEMBL15456320 | 0.79 | CA12 (0.46) | ALDH1A1CA12CA1CA2CA7 | |
| SCHEMBL472286 | 0.78 | ALDH1A1 (0.56) | ALDH1A1CA12CA7TSHRPTPN1 | |
| SCHEMBL472322 | 0.78 | ALDH1A1 (0.57) | ALDH1A1CA1CA2TSHRHSD17B10 | |
| SCHEMBL11170036 | 0.78 | ALDH1A1 (0.56) | ALDH1A1CA1CA2TSHRHSD17B10 | |
| SCHEMBL472268 | 0.78 | ALDH1A1 (0.56) | ALDH1A1TSHRHSD17B10MYCMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2202577-B1 | Chemically amplified positive resist composition and resist patterning process | SHINETSU CHEMICAL CO (JP) | 2014-08-27 | — | — | EP | claimed |
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| CN-104330955-B | For the chemical-amplification positive anti-corrosion agent composition and patterning method of EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-05-25 | — | — | CN | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| CN-104199255-B | Chemistry amplification negative resist composition and patterning method for EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-03-13 | — | — | CN | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| US-20100291484-A1 | Negative resist composition, patterning process, and testing process and preparation process of negative resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2244124-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2244125-A2 | Resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2244126-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100167207-A1 | Chemically amplified positive resist composition and resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| EP-2202577-A1 | Chemically amplified positive resist composition and resist patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| CN-101762981-A | Chemically amplified positive resist composition and resist patterning process | SHINETSU CHEMICAL CO | 2010-06-30 | — | — | CN | disclosed |
| EP-2146245-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-20100009299-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-14 | — | — | US | disclosed |
| CN-101625524-A | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100009299-A1 | Resist composition and patterning process | ARF4, FGFR2, ARF5 | ALDH1A1 2706/4885CA12 4226/4885CA1 4172/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.