Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14732671 | 0.89 | TSHR (0.33) | TSHRTHRB | |
| SCHEMBL15183396 | 0.88 | ALDH1A1 (0.32) | TSHR | |
| SCHEMBL4568746 | 0.84 | ALDH1A1 (0.39) | TSHRTHRB | |
| SCHEMBL47314 | 0.83 | THRB (0.38) | TSHRTHRB | |
| SCHEMBL12439401 | 0.82 | TSHR (0.33) | TSHRTHRB | |
| SCHEMBL14865717 | 0.82 | TSHR (0.36) | TSHRTHRB | |
| SCHEMBL864176 | 0.82 | TSHR (0.32) | TSHRTHRB | |
| SCHEMBL439029 | 0.81 | TSHR (0.35) | TSHRTHRB | |
| SCHEMBL10170981 | 0.81 | TSHR (0.34) | TSHR | |
| SCHEMBL12186473 | 0.81 | HTT (0.36) | TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119285842-A | Fluorine-containing polymer, preparation method thereof and ArF immersed photoresist prepared from fluorine-containing polymer | 瑞红(苏州)电子化学品股份有限公司 | 2025-01-10 | — | — | CN | disclosed |
| US-20200117087-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-04-16 | — | — | US | disclosed |
| US-10423083-B2 | Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate | JSR CORPORATION (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |
| US-9996002-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-06-12 | — | — | US | disclosed |
| US-9996002-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-06-12 | — | — | US | disclosed |
| US-9951164-B2 | Non-ionic aryl ketone based polymeric photo-acid generators | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-04-24 | — | — | US | disclosed |
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | CENTRAL GLASS CO., LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | CENTRAL GLASS CO., LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| WO-2010029982-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR株式会社 (JP) | 2010-03-18 | — | — | WO | disclosed |
| WO-2010007993-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR株式会社 (JP) | 2010-01-21 | — | — | WO | disclosed |
| WO-2009142182-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND PHOTORESIST FILM | JSR株式会社 (JP) | 2009-11-26 | — | — | WO | disclosed |
| WO-2009142181-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION EXPOSURE, POLYMER AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 (JP) | 2009-11-26 | — | — | WO | disclosed |
| EP-2088466-A1 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-08-12 | — | — | EP | disclosed |
| US-20090197204-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090197204-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | PPARG, PPARA, PPARD | TSHR 1168/4885THRB 698/4885DGAT1 502/4885 |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | FRG1, FBXL19, FEM1B | TSHR 400/4885THRB 1932/4885DGAT1 2705/4885 |
| US-20090197204-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | RER1, FRG1, AFF1 | TSHR 2238/4885THRB 2484/4885DGAT1 662/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.