SCHEMBL4757207

SCHEMBL4757207

CC(C=CC(=O)O)C(Sc1c(Br)cc(Br)cc1Br)Sc1c(Br)cc(Br)cc1Br

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRP O00591 2/20 0.34
GABRD O14764 2/20 0.34
GABRA1 P14867 2/20 0.34
GABRB1 P18505 2/20 0.34
GABRG2 P18507 2/20 0.34
GABRB3 P28472 2/20 0.34
GABRA5 P31644 2/20 0.34
GABRA3 P34903 2/20 0.34
GABRA2 P47869 2/20 0.34
GABRB2 P47870 2/20 0.34
GABRA4 P48169 2/20 0.34
GABRE P78334 2/20 0.34
GABRA6 Q16445 2/20 0.34
GABRG1 Q8N1C3 2/20 0.34
GABRG3 Q99928 2/20 0.34
GABRQ Q9UN88 2/20 0.34
EIF2AK2 P19525 1/20 0.32
CSNK2A2 P19784 1/20 0.32
CSNK2B P67870 1/20 0.32
CSNK2A1 P68400 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4758386 0.77 MEN1 (0.40) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL4758377 0.77 MAOA (0.40)
SCHEMBL4758781 0.72 PKM (0.41) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL4756679 0.63 HSD17B10 (0.45) HSD17B10KDM4EGAA
SCHEMBL4756681 0.63 HSD17B10 (0.45) HSD17B10KDM4EGAA
SCHEMBL122609 0.62 CSNK2A2 (0.50) EIF2AK2CSNK2A2CSNK2BCSNK2A1HSD17B10
SCHEMBL14418868 0.61 GABRP (0.56) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL4756689 0.61 LMNA (0.40) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL28898426 0.61 GABRP (0.34) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL28461983 0.61 GABRP (0.34) GABRPGABRDGABRA1GABRB1GABRG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4028480-A1 PHOTO-CURABLE COMPOSITIONS CONTAINING HIGH REFRACTIVE INDEX MONOMERS FOR USE IN 3D PRINTING APPLICATIONS ARKEMA FRANCE (FR) 2022-07-20 EP claimed
WO-2021048628-A1 PHOTO-CURABLE COMPOSITIONS CONTAINING HIGH REFRACTIVE INDEX MONOMERS FOR USE IN 3D PRINTING APPLICATIONS ARKEMA FRANCE (FR) 2021-03-18 WO claimed
EP-4028480-A1 PHOTO-CURABLE COMPOSITIONS CONTAINING HIGH REFRACTIVE INDEX MONOMERS FOR USE IN 3D PRINTING APPLICATIONS ARKEMA FRANCE (FR) 2022-07-20 EP disclosed
WO-2021048628-A1 PHOTO-CURABLE COMPOSITIONS CONTAINING HIGH REFRACTIVE INDEX MONOMERS FOR USE IN 3D PRINTING APPLICATIONS ARKEMA FRANCE (FR) 2021-03-18 WO disclosed
WO-2008073534-A1 METAL OXIDE AND SULFUR-CONTAINING COATING COMPOSITIONS, METHODS OF USE, AND ARTICLES PREPARED THEREFROM GENERAL ELECTRIC COMPANY (US) 2008-06-19 WO disclosed