Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ENPP1 | P22413 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | HPGDS | O60760 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.33 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.33 |
| ▸ | SYK | P43405 | 1/20 | 0.33 |
| ▸ | HEXA | P06865 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL7090862 | 0.98 | ENPP1 (0.43) | ENPP1MEN1KMT2APOLBPTGS2 | |
| Bromide SCHEMBL3139959 | 0.98 | ENPP1 (0.43) | ENPP1MEN1KMT2APOLBPTGS2 | |
| Perchlorate SCHEMBL3135944 | 0.91 | ENPP1 (0.39) | ENPP1MEN1KMT2APOLBPTGS2 | |
| SCHEMBL3144542 | 0.84 | LMNA (0.44) | MEN1KMT2APOLBPTGS2PTGS1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1088677 | 0.83 | ENPP1 (0.43) | ENPP1MEN1KMT2APOLBPTGS2 | |
| SCHEMBL7266829 | 0.81 | PDCD1 (0.38) | ENPP1MEN1KMT2APOLBNPC1 | |
| SCHEMBL28677960 | 0.81 | ENPP1 (0.35) | ENPP1NPC1RAB9AACHETDP1 | |
| SCHEMBL7901498 | 0.81 | PTGS2 (0.40) | ENPP1PTGS2PTGS1ACHETDP1 | |
| SCHEMBL4669356 | 0.80 | ALDH1A1 (0.41) | ENPP1KMT2AMAPK1TDP1MAPT | |
| SCHEMBL30262477 | 0.80 | MEN1 (0.44) | ENPP1MEN1KMT2APOLBNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | claimed |
| US-20260015799-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-01-15 | — | — | US | claimed |
| EP-4565378-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2025-06-11 | — | — | EP | claimed |
| US-12311406-B2 | Methods for producing optical effect layers comprising magnetic or magnetizable pigment particles and exhibiting one or more indicia | SICPA HOLDING SA (CH) | 2025-05-27 | — | — | US | claimed |
| US-20240238839-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-07-18 | — | — | US | claimed |
| WO-2024028408-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-02-08 | — | — | WO | claimed |
| EP-4313430-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2024-02-07 | — | — | EP | claimed |
| EP-1314725-B1 | SULFONIUM SALT COMPOUND | WAKO PURE CHEM IND LTD (JP) | 2008-03-19 | — | — | EP | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | disclosed |
| US-20260015799-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-01-15 | — | — | US | disclosed |
| US-12311406-B2 | Methods for producing optical effect layers comprising magnetic or magnetizable pigment particles and exhibiting one or more indicia | SICPA HOLDING SA (CH) | 2025-05-27 | — | — | US | disclosed |
| US-20240238839-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-07-18 | — | — | US | disclosed |
| WO-2024028408-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-02-08 | — | — | WO | disclosed |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030017425-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-01-23 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, DNMT3A, PIM3 | ENPP1 2348/4885MEN1 3540/4885KMT2A 1111/4885 |
| US-20260015799-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | IK, TEX10, INCENP | ENPP1 4302/4885MEN1 903/4885KMT2A 3140/4885 |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | ABL1, PI4K2B, FES | ENPP1 1443/4885MEN1 4211/4885KMT2A 2847/4885 |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | PNN, PI4K2B, PI4K2A | ENPP1 791/4885MEN1 4165/4885KMT2A 3202/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.