Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL6633199 | 0.92 | TSHR (0.38) | TSHR | |
| Fluoride Ion SCHEMBL7871209 | 0.92 | TSHR (0.38) | TSHR | |
| Bromide SCHEMBL31683217 | 0.92 | TSHR (0.38) | TSHR | |
| SCHEMBL7874589 | 0.92 | TSHR (0.38) | TSHR | |
| Iodide SCHEMBL31682997 | 0.92 | TSHR (0.38) | TSHR | |
| SCHEMBL3331250 | 0.82 | TSHR (0.32) | TSHR | |
| Bicarbonate SCHEMBL4384553 | 0.77 | CA2 (0.38) | TSHR | |
| Propionic Acid SCHEMBL7874567 | 0.73 | CA2 (0.40) | TSHR | |
| Water SCHEMBL8394148 | 0.67 | — | — | |
| Water SCHEMBL31683038 | 0.67 | TSHR (0.38) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6316575-B1 | MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 2001-11-13 | — | — | US | claimed |
| US-20260071095-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2026-03-12 | — | — | US | disclosed |
| US-20250320381-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250282977-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2025-09-11 | — | — | US | disclosed |
| US-7390868-B2 | Catalyst for polycarbonate production and process for producing polycarbonate | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-06-24 | — | — | US | disclosed |
| US-20070043199-A1 | Catalyst for polycarbonate production and process for producing polycarbonate | IDEMITSU KOSAN CO., LTD. (JP) | 2007-02-22 | — | — | US | disclosed |
| EP-0807657-B1 | PROCESS FOR PRODUCING POLYCARBONATE | IDEMITSU KOSAN CO (JP) | 2004-05-19 | — | — | EP | disclosed |
| US-5922826-A | TRANSESTERIFICATION IN PRESENCE OF A POLYMERIZATION CATALYST CONTAINING AN ORGANONITROGEN COMPOUND AND A QUATERNARY PHOSPHONIUM SALT TO PRODUCE POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 1999-07-13 | — | — | US | disclosed |
| EP-0807657-A1 | PROCESS FOR PRODUCING POLYCARBONATE | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-11-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260071095-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | PIEZO1, ZAP70, CAPN1 | TSHR 3219/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.