Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 6/20 | 0.48 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.45 |
| ▸ | GSK3B | P49841 | 2/20 | 0.45 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.45 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.44 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98167 | 0.98 | KMT2A (0.50) | KMT2AMAPTMAPK1HPGDTDP1 | |
| SCHEMBL685958 | 0.96 | KMT2A (0.48) | KMT2AMAPTMAPK1HPGDTDP1 | |
| Hydrochloric Acid SCHEMBL4028699 | 0.96 | KMT2A (0.48) | KMT2AMAPTMAPK1HPGDTDP1 | |
| SCHEMBL715255 | 0.91 | KMT2A (0.44) | KMT2AMAPTMAPK1HPGDTDP1 | |
| SCHEMBL686332 | 0.87 | SMN1; SMN2 (0.53) | MAPTMAPK1HPGDCYP3A4KDM4E | |
| SCHEMBL2754884 | 0.83 | ERCC5 (0.54) | HPGDSMN1; SMN2ALDH1A1ERCC5FEN1 | |
| SCHEMBL8737972 | 0.83 | HPGD (0.49) | KMT2AMAPTMAPK1HPGDTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3096657 | 0.83 | MAPT (0.37) | KMT2AMAPTMAPK1HPGDTDP1 | |
| Bromide SCHEMBL2521756 | 0.81 | GSK3B (0.48) | KMT2AMAPTMEN1CES1SMN1; SMN2 | |
| SCHEMBL685960 | 0.81 | ALDH1A1 (0.49) | KMT2AMAPTMAPK1HPGDTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2256551-B1 | Pattern forming process using a chemically amplified resist composition | SHINETSU CHEMICAL CO (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-8614046-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8288076-B2 | Chemically amplified resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| EP-2112554-B1 | Sulfonium salt-containing polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20030017415-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-01-23 | — | — | US | disclosed |
| US-20020146641-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-10 | — | — | US | disclosed |
| EP-1207423-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-22 | — | — | EP | disclosed |
| EP-0555058-B1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MFG CO (JP) | 1997-05-07 | — | — | EP | disclosed |
| US-5500453-A | INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS | TOYO INK MANUFACTURING CO., LTD. (JP) | 1996-03-19 | — | — | US | disclosed |
| EP-0555058-A1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MANUFACTURING CO., LTD. (JP) | 1993-08-11 | — | — | EP | disclosed |
| EP-0122576-B1 | PROCESS FOR THE PRODUCTION OF VICINAL POLYCARBONYL COMPOUNDS | BASF Aktiengesellschaft (DE) | 1985-11-06 | — | — | EP | disclosed |
| EP-0122576-A1 | Process for the production of vicinal polycarbonyl compounds | BASF Aktiengesellschaft (DE) | 1984-10-24 | — | — | EP | disclosed |
| US-4196298-A | Cyclic sulfonium ylids | THE DOW CHEMICAL COMPANY (US) | 1980-04-01 | — | — | US | disclosed |
| US-4196298-A | Cyclic sulfonium ylids | THE DOW CHEMICAL COMPANY (US) | 1980-04-01 | — | — | US | disclosed |