Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 6/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | CES1 | P23141 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.47 |
| ▸ | GSK3B | P49841 | 2/20 | 0.47 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.45 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL4028699 | 0.98 | KMT2A (0.48) | KMT2AMAPTMAPK1TDP1MEN1 | |
| SCHEMBL685958 | 0.98 | KMT2A (0.48) | KMT2AMAPTMAPK1TDP1MEN1 | |
| Bromide SCHEMBL482705 | 0.98 | KMT2A (0.48) | KMT2AMAPTMAPK1TDP1MEN1 | |
| SCHEMBL715255 | 0.93 | KMT2A (0.44) | KMT2AMAPTMAPK1TDP1MEN1 | |
| SCHEMBL686332 | 0.89 | SMN1; SMN2 (0.53) | MAPTMAPK1CYP3A4HPGDKDM4E | |
| SCHEMBL2754884 | 0.85 | ERCC5 (0.54) | HPGDSMN1; SMN2ALDH1A1ERCC5FEN1 | |
| SCHEMBL8737972 | 0.85 | HPGD (0.49) | KMT2AMAPTMAPK1TDP1MEN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3096657 | 0.84 | MAPT (0.37) | KMT2AMAPTMAPK1TDP1MEN1 | |
| SCHEMBL685960 | 0.83 | ALDH1A1 (0.49) | KMT2AMAPTMAPK1TDP1MEN1 | |
| SCHEMBL106663 | 0.82 | NPC1 (0.48) | MAPTTDP1CYP3A4HPGDKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2586 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260116071-A1 | METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD | CANON KK (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-3741811-B1 | COMPOUND, INK, RESIST COMPOSITION FOR COLOR FILTER, THERMAL TRANSFER RECORDING SHEET, AND TONER | CANON KK (JP) | 2026-03-11 | — | — | EP | disclosed |
| EP-4696511-A1 | INK-JET RECORDING HEAD | Canon Kabushiki Kaisha (JP) | 2026-02-18 | — | — | EP | disclosed |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042294-A1 | INK-JET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-6689530-B2 | ULTRAVIOLET LITHOGRAPHY MICROFABRICATION WITH IMPROVED RESOLUTION AND PATTERN PROFILE AFTER DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20030235779-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-20 | — | — | US | disclosed |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-06 | — | — | US | disclosed |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-0555058-B1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MFG CO (JP) | 1997-05-07 | — | — | EP | disclosed |
| US-5500453-A | INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS | TOYO INK MANUFACTURING CO., LTD. (JP) | 1996-03-19 | — | — | US | disclosed |
| EP-0555058-A1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MANUFACTURING CO., LTD. (JP) | 1993-08-11 | — | — | EP | disclosed |