Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.48 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.45 |
| ▸ | GSK3B | P49841 | 2/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.45 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.45 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.45 |
| ▸ | PLOD2 | O00469 | 2/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.44 |
| ▸ | PLOD3 | O60568 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98167 | 0.98 | KMT2A (0.50) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| Bromide SCHEMBL482705 | 0.96 | KMT2A (0.48) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| SCHEMBL685958 | 0.96 | KMT2A (0.48) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| SCHEMBL715255 | 0.91 | KMT2A (0.44) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| SCHEMBL686332 | 0.87 | SMN1; SMN2 (0.53) | MAPTMAPK1CYP3A4HPGDKDM4E | |
| SCHEMBL2754884 | 0.83 | ERCC5 (0.54) | HPGDSMN1; SMN2ALDH1A1ERCC5FEN1 | |
| SCHEMBL8737972 | 0.83 | HPGD (0.49) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| Trifluoromethanesulfonic Acid SCHEMBL3096657 | 0.83 | MAPT (0.37) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| Hydrochloric Acid SCHEMBL3922638 | 0.81 | ALDH1A1 (0.51) | KMT2AMAPTMAPK1CYP3A4HPGD | |
| SCHEMBL685960 | 0.81 | ALDH1A1 (0.49) | KMT2AMAPTMAPK1CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025128332-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| WO-2025128334-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-20250188311-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250189892-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| EP-3398202-B1 | PHOTOSENSITIVE STACKED STRUCTURE | FUJIFILM ELECTRONIC MAT USA INC (US) | 2023-08-09 | — | — | EP | disclosed |
| US-11175582-B2 | Photosensitive stacked structure | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | disclosed |
| US-20190018321-A1 | PHOTOSENSITIVE STACKED STRUCTURE | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-01-17 | — | — | US | disclosed |
| EP-3398202-A1 | PHOTOSENSITIVE STACKED STRUCTURE | FujiFilm Electronic Materials USA, Inc. (US) | 2018-11-07 | — | — | EP | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | disclosed |
| EP-0624827-A1 | Method of making micropatterns | CIBA-GEIGY AG (CH) | 1994-11-17 | — | — | EP | disclosed |
| EP-0601974-A1 | Positive photoresist with better properties | OCG Microelectronic Materials Inc. (US) | 1994-06-15 | — | — | EP | disclosed |
| US-5274060-A | Copolymers crosslinkable by acid catalysis | CIBA-GEIGY CORPORATION (US) | 1993-12-28 | — | — | US | disclosed |
| US-5238781-A | PHOTOSENSITIVE COMPOSITIONS BASED ON POLYPHENOLS AND ACETALS | CIBA-GEIGY CORPORATION (US) | 1993-08-24 | — | — | US | disclosed |
| EP-0502819-A1 | Acid hardenable copolymers | CIBA-GEIGY AG (CH) | 1992-09-09 | — | — | EP | disclosed |
| EP-0501919-A1 | Radiation-sensitive compositions based on polyphenols and acetals | CIBA-GEIGY AG (CH) | 1992-09-02 | — | — | EP | disclosed |
| EP-0085024-B1 | METHOD FOR PRODUCING IMAGES IN PHOTORESIST LAYERS | CIBA-GEIGY AG (CH) | 1987-07-15 | — | — | EP | disclosed |
| US-4439517-A | Process for the formation of images with epoxide resin | CIBA-GEIGY CORPORATION (US) | 1984-03-27 | — | — | US | disclosed |
| EP-0085024-A2 | Method for producing images in photoresist layers | CIBA-GEIGY AG (CH) | 1983-08-03 | — | — | EP | disclosed |
| US-4196298-A | Cyclic sulfonium ylids | THE DOW CHEMICAL COMPANY (US) | 1980-04-01 | — | — | US | disclosed |