SCHEMBL483425

SCHEMBL483425

CO[Ti](CCCN)(OC)OC

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFKB1 P19838 1/20 0.33
DNM1 Q05193 5/20 0.32
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA3 P07451 2/20 0.32
CA4 P22748 2/20 0.32
CA6 P23280 2/20 0.32
CA5A P35218 2/20 0.32
CA7 P43166 2/20 0.32
CA9 Q16790 2/20 0.32
CA14 Q9ULX7 2/20 0.32
CA5B Q9Y2D0 2/20 0.32
TSHR P16473 2/20 0.32
LMNA P02545 1/20 0.32
BLM P54132 1/20 0.32
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
ALDH1A1 P00352 1/20 0.30
ODC1 P11926 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2776155 0.89 DNM1 (0.42) NFKB1DNM1CA12CA1CA2
SCHEMBL18528518 0.79 DNM1 (0.48) NFKB1DNM1CA12CA1CA2
Butylamine SCHEMBL18528555 0.79 DNM1 (0.42) DNM1TSHRMEN1KMT2AALDH1A1
SCHEMBL18528516 0.78 CA12 (0.50) CA12CA1CA2CA3CA4
SCHEMBL8856018 0.77 NFKB1 (0.33) NFKB1DNM1CA12CA1CA2
SCHEMBL18528596 0.74 NFKB1 (0.32) NFKB1DNM1CA12CA1CA2
SCHEMBL1795539 0.73 TSHR (0.35) TSHRLMNA
SCHEMBL483477 0.72 DNM1 (0.33) NFKB1DNM1TSHRMEN1KMT2A
SCHEMBL18528744 0.71 TSHR (0.33) TSHRALDH1A1
SCHEMBL483111 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114381195-A Insect-proof heat-insulating coating for trees and preparation method thereof 李步芹 2022-04-22 CN claimed
US-20260133485-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2026-05-14 US disclosed
US-20260093180-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FILM FORMATION JSR CORPORATION (JP) 2026-04-02 US disclosed
US-12516074-B2 Composition, film, method of forming film, method of forming pattern, method of forming organic-underlayer-film reverse pattern, and method of producing composition JSR CORPORATION (JP) 2026-01-06 US disclosed
EP-4660703-A2 METAL-CONTAINING FILM PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
US-20250368837-A1 Composition For Forming Metal-Containing Film And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-04 US disclosed
US-20250372377-A1 METAL-CONTAINING FILM PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-04 US disclosed
US-20250362595-A1 COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-27 US disclosed
EP-4653955-A2 COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-26 EP disclosed
EP-4606882-A1 CLEANING SOLUTION, METHOD FOR CLEANING SUBSTRATE, AND METHOD FOR FORMING METAL-CONTAINING FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-08-27 EP disclosed
CN-101682955-A Organic electroluminescent element and display device using the same SUMITOMO CHEMICAL CO 2010-03-24 CN disclosed
US-20100045901-A1 OPTICAL FILM AND RETARDATION SHEET, AND LIQUID CRYSTAL COMPOUND FUJIFILM CORPORATION (JP) 2010-02-25 US disclosed
WO-2009029053-A1 METHOD OF COATING A PARTICLE AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2009-03-05 WO disclosed
WO-2008072794-A1 OPTICAL FILM AND RETARDATION SHEET, AND LIQUID CRYSTAL COMPOUND FUJIFILM CORPORATION (JP) 2008-06-19 WO disclosed
CN-1269930-C Release adhesive composition and method for producing same KAKEN TECH CO LTD (JP) 2006-08-16 CN disclosed
CN-1552654-A Irregular decorative pattern coating glass container and producing method thereof 上海高雅玻璃有限公司 2004-12-08 CN disclosed
CN-1481428-A Removable adhesive compsns and process for producing same 化研科技株式会社 2004-03-10 CN disclosed
US-5629066-A A COATED RESIN LAYER COVERING THE SURFACE OF FILM OR SHEET, IS MADE OF AN AMINO GROUP CONTAINING POLYMER AND/OR A POLYMER OF METHACRYLATE OF ISOCYANURIC ACID, HAVING AN EXPOSED SURFACE QUATERNIZED WITH ALKYL SULFATE OR SULFONATES TEIJIN LIMITED (JP) 1997-05-13 US disclosed
EP-0519420-B1 Resin article having anti-static property TEIJIN LTD (JP) 1995-12-20 EP disclosed
EP-0519420-A1 Resin article having anti-static property TEIJIN LIMITED (JP) 1992-12-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260093180-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FILM FORMATION SMC4, TYR, SMC2 NFKB1 4622/4885DNM1 3512/4885CA12 157/4885
US-20260133485-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION TWF2, TERF2, TPR NFKB1 3911/4885DNM1 4662/4885CA12 993/4885
US-20100045901-A1 OPTICAL FILM AND RETARDATION SHEET, AND LIQUID CRYSTAL COMPOUND C1R, CCNA1, C5 NFKB1 1671/4885DNM1 1602/4885CA12 1414/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.