SCHEMBL4835211

SCHEMBL4835211

C=Cc1ccc(S(=O)(=O)ON2C(=O)C3CC4C(=O)N(OS(=O)(=O)c5ccc(C=C)cc5)C(=O)C4CC3C2=O)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.41
PARL Q9H300 2/20 0.41
KMT2A Q03164 3/20 0.37
VDR P11473 2/20 0.37
MEN1 O00255 2/20 0.37
ALDH1A1 P00352 8/20 0.36
KDM4E B2RXH2 6/20 0.36
HPGD P15428 5/20 0.36
MAPT P10636 4/20 0.36
F2 P00734 1/20 0.34
LMNA P02545 2/20 0.33
THRB P10828 1/20 0.33
HTT P42858 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HCRTR1 O43613 1/20 0.31
HCRTR2 O43614 1/20 0.31
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14382078 0.89 MAPT (0.39) TDP1PARLKMT2AVDRMEN1
SCHEMBL14382806 0.89 ALDH1A1 (0.40) TDP1PARLKMT2AVDRMEN1
SCHEMBL4829685 0.86 TDP1 (0.44) TDP1PARLKMT2AVDRMEN1
SCHEMBL5367011 0.81 PARL (0.62) TDP1PARLKMT2AVDRMEN1
SCHEMBL4831931 0.81 KMT2A (0.55) PARLKMT2AVDRMEN1ALDH1A1
SCHEMBL4835027 0.81 TDP1 (0.40) TDP1PARLKMT2AVDRMEN1
SCHEMBL4837175 0.80 ALDH1A1 (0.50) TDP1PARLKMT2AVDRMEN1
SCHEMBL4837258 0.80 VDR (0.58) PARLKMT2AVDRMEN1ALDH1A1
SCHEMBL4832240 0.80 KDM4E (0.50) PARLKMT2AVDRMEN1ALDH1A1
SCHEMBL4830039 0.80 PARL (0.44) PARLKMT2AVDRMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 TDP1 2088/4885PARL 1086/4885KMT2A 1016/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.