Water

Water

SCHEMBL4846582

O.OCC(O)COCC(O)CO

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
THRB known ✓ P10828 1/20 0.40
AGTR1 known ✓ P30556 1/20 0.35
MEN1 known ✓ O00255 2/20 0.34
LMNA P02545 4/20 0.50
USP2 O75604 1/20 0.50
ALDH1A1 P00352 1/20 0.50
KDM4E B2RXH2 4/20 0.40
CYP1A2 P05177 3/20 0.35
KMT2A Q03164 2/20 0.34
DUSP3 P51452 1/20 0.34
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33
CYP2C19 P33261 1/20 0.33
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL28968004 1.00 LMNA (0.50) LMNAUSP2ALDH1A1KDM4ETHRB
Glycerin SCHEMBL28968005 0.97 LMNA (0.56) LMNAUSP2ALDH1A1KDM4ETHRB
Water SCHEMBL27747101 0.97 USP2 (0.48) LMNAUSP2ALDH1A1KDM4ETHRB
Water SCHEMBL27671478 0.97 USP2 (0.48) LMNAUSP2ALDH1A1KDM4ETHRB
SCHEMBL30754 0.97 LMNA (0.53) LMNAUSP2ALDH1A1KDM4ETHRB
SCHEMBL1638881 0.97 LMNA (0.53) LMNAUSP2ALDH1A1KDM4ETHRB
SCHEMBL25238278 0.93 LMNA (0.50) LMNAUSP2ALDH1A1KDM4ETHRB
Glycerin SCHEMBL2582537 0.93 LMNA (0.60) LMNAUSP2ALDH1A1KDM4ETHRB
SCHEMBL15894238 0.93 LMNA (0.50) LMNAUSP2ALDH1A1KDM4ETHRB
SCHEMBL821029 0.93 LMNA (0.50) LMNAUSP2ALDH1A1KDM4ETHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1196734-C Foamed polyester resin moulding and process for producing the same NIPPON RESIN RES INST CO LTD (JP) 2005-04-13 CN claimed
CN-1325420-A Foamed polyester resin moulding and process for producing the same NIPPON RESIN RES INST CO LTD (JP) 2001-12-05 CN claimed
WO-2020181642-A1 PREPARATION METHOD FOR IONIC BOND-COVALENT BOND SYNERGY-BASED SURFACE HEPARINIZED ANTICOAGULANT MEDICAL DEVICE 江苏赛腾医疗科技有限公司 2020-09-17 WO disclosed
CN-103360728-A Phosphorus-containing copolyester foam combined material and method for preparing phosphorus-containing copolyester foam by adopting phosphorus-containing copolyester foam combined material CHANGZHOU TIANSHENG NEW MATERIALS STOCK CO LTD 2013-10-23 CN disclosed
EP-2002010-A2 BIOMASS FUEL SYNTHESIS METHODS FOR INCRESED ENERGY EFFICIENCY ALTERVIA ENERGY, LLC (US) 2008-12-17 EP disclosed
WO-2007112090-A2 BIOMASS FUEL SYNTHESIS METHODS FOR INCRESED ENERGY EFFICIENCY ALTERVIA ENERGY, LLC (US) 2007-10-04 WO disclosed
US-20070161095-A1 Biomass Fuel Synthesis Methods for Increased Energy Efficiency ALTERVIA ENERGY, LLC 2007-07-12 US disclosed
CN-1325415-C Dielectric/spacer composite for plasma display and method of manufacturing the same KOREA ADVANCED INST SCI & TECH (KR) 2007-07-11 CN disclosed
CN-1272361-C photosensitive resin, resin composition and cured product thereof NIPPON KAYAKU KK (JP) 2006-08-30 CN disclosed
CN-1680207-A Dielectric/spacer composite for plasma display and method of manufacturing the same KOREA INST SCI & TECH (KR) 2005-10-12 CN disclosed
CN-1196734-C Foamed polyester resin moulding and process for producing the same NIPPON RESIN RES INST CO LTD (JP) 2005-04-13 CN disclosed
CN-1471551-A High functional polymers 万迪科股份公司 2004-01-28 CN disclosed
CN-1427020-A Water-soluble resin and its application in paper paint SUMITOMO CHEMICAL CO (JP) 2003-07-02 CN disclosed
CN-1101413-C Water-soluble resin and application thereof in paper coating SUMITOMO CHEMICAL CO (JP) 2003-02-12 CN disclosed
CN-1083871-C Epoxy Adhesives Containing Dithiooxamide Adhesion Promoters MINNESOTA MINING & MFG (US) 2002-05-01 CN disclosed
CN-1325420-A Foamed polyester resin moulding and process for producing the same NIPPON RESIN RES INST CO LTD (JP) 2001-12-05 CN disclosed
CN-1180369-A Epoxy adhesives containing dithio * amide adhesion promoters MINNESOTA MINNG AND MANUFACTUR (US) 1998-04-29 CN disclosed
CN-1168390-A Water-soluble resin and application thereof in paper coating SUMITOMO CHEMICAL CO (JP) 1997-12-24 CN disclosed
CN-1026009-C Process for coating electrically conducting substrates, substrates coated by this process and aqueous electrocoating baths BASF LACKE & FARBEN (DE) 1994-09-28 CN disclosed
CN-1039074-A The technology ground that this technology is coated with and the moisture electric coating groove of electropaining electrically conductive substrates BASF LACKE & FARBEN (DE) 1990-01-24 CN disclosed