SCHEMBL4858460

SCHEMBL4858460

COc1ccc(S(OS(=O)(=O)C(F)(F)F)(c2ccc(O)cc2)c2ccc(O)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 2/20 0.58
GAA P10253 2/20 0.58
HSD11B1 P28845 1/20 0.48
LTA4H P09960 1/20 0.44
ESR2 Q92731 1/20 0.44
TAS2R14 Q9NYV8 1/20 0.43
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
MMP13 P45452 1/20 0.42
TUBB4A P04350 1/20 0.42
TUBB P07437 1/20 0.42
TUBA3C P0DPH7 1/20 0.42
TUBA1B P68363 1/20 0.42
TUBA4A P68366 1/20 0.42
TUBB4B P68371 1/20 0.42
TUBB3 Q13509 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL454993 0.92 PKM (0.52) PKMGAAHSD11B1CA1CA2
SCHEMBL3146242 0.89 LMNA (0.43) PKMGAAHSD11B1ESR2CA1
SCHEMBL3143634 0.88 PKM (0.47) PKMGAAHSD11B1CA1CA2
SCHEMBL36493 0.88 PKM (0.47) PKMGAAHSD11B1CA1CA2
SCHEMBL4848809 0.86 PKM (0.46) PKMGAAHSD11B1TAS2R14CA1
SCHEMBL8862179 0.84 ACHE (0.42) PKMGAAESR2CA1CA2
SCHEMBL548280 0.84 ESR1 (0.42) GAAHSD11B1ESR2CA1CA2
SCHEMBL8497205 0.84 HSD11B1 (0.47) PKMGAAHSD11B1CA1CA2
SCHEMBL9418423 0.79 PKM (0.52) PKMGAAHSD11B1CA1CA2
Mequinol SCHEMBL8898999 0.79 PKM (0.61) PKMGAAHSD11B1LTA4HESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7323284-B2 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2008-01-29 US disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed