SCHEMBL4891573

SCHEMBL4891573

Cc1ccc(S(=O)(=O)ON=C(c2ccccc2)C(F)(Cl)C(=O)C2CCCCC2)cc1

nearest known ligand 0.40

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ENPP3 O14638 6/20 0.40
ENPP2 Q13822 6/20 0.40
ENPP1 P22413 5/20 0.40
ALDH1A1 P00352 3/20 0.38
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
RAB9A P51151 1/20 0.36
APLNR P35414 2/20 0.35
POLB P06746 1/20 0.34
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4901721 0.87 ALDH1A1 (0.37) ENPP3ENPP2ENPP1ALDH1A1MEN1
SCHEMBL4902635 0.85 ALDH1A1 (0.37) ENPP3ENPP2ENPP1ALDH1A1MEN1
SCHEMBL4903129 0.81 ALDH1A1 (0.35) ENPP3ENPP2ENPP1ALDH1A1MEN1
SCHEMBL16063707 0.78 LMNA (0.42) ALDH1A1MEN1KMT2ARAB9APOLB
SCHEMBL4899581 0.78 KMT2A (0.37) ALDH1A1MEN1KMT2APOLB
SCHEMBL4903378 0.76 KMT2A (0.38) ALDH1A1MEN1KMT2APOLB
SCHEMBL4900892 0.75 KMT2A (0.42) ALDH1A1MEN1KMT2ARAB9APOLB
SCHEMBL547035 0.73 MAPT (0.44) ALDH1A1MEN1KMT2ARAB9A
SCHEMBL547034 0.73 MAPT (0.44) ALDH1A1MEN1KMT2ARAB9A
SCHEMBL13037415 0.71 STAT3 (0.47) ALDH1A1MEN1KMT2ARAB9APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed