SCHEMBL6875352

SCHEMBL6875352

CCCCCCS(=O)(=O)ON=C(c1ccccc1)C(F)(F)S(=O)(=O)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 4/20 0.37
S1PR3 Q99500 1/20 0.36
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
MMP1 P03956 1/20 0.35
MMP9 P14780 1/20 0.35
MMP13 P45452 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
NAAA Q02083 1/20 0.35
POLB P06746 1/20 0.34
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6873824 0.99 PTGS2 (0.36) PTGS2S1PR3CES2CES1MMP1
SCHEMBL4895537 0.91 TDP1 (0.35) PTGS2MEN1KMT2APOLBTDP1
SCHEMBL4902695 0.87 PSIP1 (0.35) MEN1KMT2APOLB
SCHEMBL4903237 0.83 HSD11B1 (0.43) PTGS2CES2CES1MMP1MMP9
SCHEMBL4903140 0.81 NPSR1 (0.34) PTGS2CES2CES1MMP1MMP9
SCHEMBL4891641 0.79 KMT2A (0.35) PTGS2CES1MEN1KMT2A
SCHEMBL4903190 0.79 HSD11B1 (0.45) PTGS2CES2CES1MMP1MMP9
SCHEMBL4897641 0.78 KMT2A (0.36) CES1MEN1KMT2ATDP1
SCHEMBL4897515 0.78 KMT2A (0.35) MEN1KMT2ATDP1
SCHEMBL6878029 0.77 L3MBTL1 (0.35) CES2CES1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed