SCHEMBL6876264

SCHEMBL6876264

CC(C)S(=O)(=O)ON=C(c1ccccc1)C(F)(F)S(=O)(=O)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 1/20 0.36
KMT2A Q03164 3/20 0.35
HPGD P15428 2/20 0.35
MITF O75030 1/20 0.35
LMNA P02545 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
HSD11B1 P28845 3/20 0.32
MAPT P10636 3/20 0.32
MLYCD O95822 1/20 0.32
NR1I2 O75469 1/20 0.32
GAA P10253 1/20 0.32
KAT6A Q92794 1/20 0.31
F2 P00734 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4891641 0.85 KMT2A (0.35) RAB9AKMT2ALMNAALDH1A1KDM4E
SCHEMBL4897641 0.83 KMT2A (0.36) RAB9AKMT2AHPGDLMNASMN1; SMN2
SCHEMBL4902695 0.82 PSIP1 (0.35) RAB9AKMT2AHPGDALDH1A1KDM4E
SCHEMBL4900892 0.79 KMT2A (0.42) RAB9AKMT2ALMNASMN1; SMN2ALDH1A1
SCHEMBL4895537 0.79 TDP1 (0.35) RAB9AKMT2AHPGDALDH1A1MEN1
SCHEMBL6873824 0.77 PTGS2 (0.36) KMT2AMEN1MAPTKAT6A
SCHEMBL4903202 0.76 HSD11B1 (0.45) RAB9AKMT2ASMN1; SMN2ALDH1A1HSD11B1
SCHEMBL6875352 0.76 PTGS2 (0.37) KMT2AMEN1
SCHEMBL4903678 0.75 HSD11B1 (0.44) RAB9AKMT2ALMNASMN1; SMN2ALDH1A1
SCHEMBL6880057 0.75 GAA (0.43) KMT2AHPGDSMN1; SMN2ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed